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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 20 — Sep. 26, 2011
  • pp: 19093–19103

Plasmonic and Mie scattering control of far-field interference for regular ripple formation on various material substrates

Go Obara, Naoki Maeda, Tomoya Miyanishi, Mitsuhiro Terakawa, Nikolay N. Nedyalkov, and Minoru Obara  »View Author Affiliations


Optics Express, Vol. 19, Issue 20, pp. 19093-19103 (2011)
http://dx.doi.org/10.1364/OE.19.019093


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Abstract

We present experimental and theoretical results on plasmonic control of far-field interference for regular ripple formation on semiconductor and metal. Experimental observation of interference ripple pattern on Si substrate originating from the gold nanosphere irradiated by femtosecond laser is presented. Gold nanosphere is found to be an origin for ripple formation. Arbitrary intensity ripple patterns are theoretically controllable by depositing desired plasmonic and Mie scattering far-field pattern generators. The plasmonic far-field generation is demonstrated not only by metallic nanostructures but also by the controlled surface structures such as ridge and trench structures on various material substrates.

© 2011 OSA

OCIS Codes
(290.4020) Scattering : Mie theory
(350.3390) Other areas of optics : Laser materials processing
(350.4238) Other areas of optics : Nanophotonics and photonic crystals
(220.4241) Optical design and fabrication : Nanostructure fabrication
(250.5403) Optoelectronics : Plasmonics

ToC Category:
Scattering

History
Original Manuscript: July 21, 2011
Revised Manuscript: August 6, 2011
Manuscript Accepted: August 18, 2011
Published: September 15, 2011

Virtual Issues
Vol. 6, Iss. 10 Virtual Journal for Biomedical Optics

Citation
Go Obara, Naoki Maeda, Tomoya Miyanishi, Mitsuhiro Terakawa, Nikolay N. Nedyalkov, and Minoru Obara, "Plasmonic and Mie scattering control of far-field interference for regular ripple formation on various material substrates," Opt. Express 19, 19093-19103 (2011)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-19-20-19093


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