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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 20 — Sep. 26, 2011
  • pp: 19296–19309

Accurate near-field lithography modeling and quantitative mapping of the near-field distribution of a plasmonic nanoaperture in a metal

Yongwoo Kim, Howon Jung, Seok Kim, Jinhee Jang, Jae Yong Lee, and Jae W. Hahn  »View Author Affiliations

Optics Express, Vol. 19, Issue 20, pp. 19296-19309 (2011)

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In nanolithography using optical near-field sources to push the critical dimension below the diffraction limit, optimization of process parameters is of utmost importance. Herein we present a simple analytic model to predict photoresist profiles with a localized evanescent exposure that decays exponentially in a photoresist of finite contrast. We introduce the concept of nominal developing thickness (NDT) to determine the proper developing process that yields the best topography of the exposure profile fitting to the isointensity contour. Based on this model, we experimentally investigated the NDT and obtained exposure profiles produced by the near-field distribution of a bowtie-shaped nanoaperture. The profiles were properly fit to the calculated results obtained by the finite differential time domain method. Using the threshold exposure dose of a photoresist, we can determine the absolute intensity of the intensity distribution of the near field and analyze the difference in decay rates of the near field distributions obtained via experiment and calculation. For maximum depth of 41 nm, we estimate the uncertainties in the measurements of profile and intensity to be less than 6% and about 1%, respectively. We expect this method will be useful in detecting the absolute value of the near-field distribution produced by nano-scale devices.

© 2011 OSA

OCIS Codes
(240.6680) Optics at surfaces : Surface plasmons
(110.4235) Imaging systems : Nanolithography
(220.4241) Optical design and fabrication : Nanostructure fabrication
(310.6628) Thin films : Subwavelength structures, nanostructures

ToC Category:
Imaging Systems

Original Manuscript: July 11, 2011
Revised Manuscript: August 29, 2011
Manuscript Accepted: August 29, 2011
Published: September 20, 2011

Yongwoo Kim, Howon Jung, Seok Kim, Jinhee Jang, Jae Yong Lee, and Jae W. Hahn, "Accurate near-field lithography modeling and quantitative mapping of the near-field distribution of a plasmonic nanoaperture in a metal," Opt. Express 19, 19296-19309 (2011)

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  1. M. M. Alkaisi, R. J. Blaikie, S. J. McNab, R. Cheung, and D. R. S. Cumming, “Sub-diffraction-limited patterning using evanescent near-field optical lithography,” Appl. Phys. Lett. 75(22), 3560–3562 (1999). [CrossRef]
  2. W. Srituravanich, N. Fang, C. Sun, Q. Luo, and X. Zhang, “Plasmonic nanolithography,” Nano Lett. 4(6), 1085–1088 (2004). [CrossRef]
  3. A. Sundaramurthy, P. J. Schuck, N. R. Conley, D. P. Fromm, G. S. Kino, and W. E. Moerner, “Toward nanometer-scale optical photolithography: utilizing the near-field of bowtie optical nanoantennas,” Nano Lett. 6(3), 355–360 (2006). [CrossRef] [PubMed]
  4. L. Wang, E. X. Jin, S. M. Uppuluri, and X. Xu, “Contact optical nanolithography using nanoscale C-shaped apertures,” Opt. Express 14(21), 9902–9908 (2006). [CrossRef] [PubMed]
  5. X. Luo and T. Ishihara, “Surface plasmon resonant interference nanolithography technique,” Appl. Phys. Lett. 84(23), 4780–4782 (2004). [CrossRef]
  6. Z. W. Liu, Q. H. Wei, and X. Zhang, “Surface plasmon interference nanolithography,” Nano Lett. 5(5), 957–961 (2005). [CrossRef] [PubMed]
  7. K. V. Sreekanth, V. M. Murukeshan, and J. K. Chua, “A planar layer configuration for surface plasmon interference nanoscale lithography,” Appl. Phys. Lett. 93(9), 093103 (2008). [CrossRef]
  8. S. A. Campbell, The science and engineering of microelectronic fabrication (Oxford University Press, New York, 1996).
  9. S. Davy and M. Spajer, “Near field optics: Snapshot of the field emitted by a nanosource using a photosensitive polymer,” Appl. Phys. Lett. 69(22), 3306–3308 (1996). [CrossRef]
  10. R. Guo, E. C. Kinzel, Y. Li, S. M. Uppuluri, A. Raman, and X. Xu, “Three-dimensional mapping of optical near field of a nanoscale bowtie antenna,” Opt. Express 18(5), 4961–4971 (2010). [CrossRef] [PubMed]
  11. D. Amarie, N. D. Rawlinson, W. L. Schaich, B. Dragnea, and S. C. Jacobson, “Three-dimensional mapping of the light intensity transmitted through nanoapertures,” Nano Lett. 5(7), 1227–1230 (2005). [CrossRef] [PubMed]
  12. R. C. Rumpf and E. G. Johnson, “Comprehensive modeling of near-field nano-patterning,” Opt. Express 13(18), 7198–7208 (2005). [CrossRef] [PubMed]
  13. E. Lee and J. W. Hahn, “Modeling of three-dimensional photoresist profiles exposed by localized fields of high-transmission nano-apertures,” Nanotechnology 19(27), 275303 (2008). [CrossRef] [PubMed]
  14. E. Lee and J. W. Hahn, “The effect of photoresist contrast on the exposure profiles obtained with evanescent fields of nanoapertures,” J. Appl. Phys. 103(8), 083550 (2008). [CrossRef]
  15. Y. Kim, S. Kim, H. Jung, E. Lee, and J. W. Hahn, “Plasmonic nano lithography with a high scan speed contact probe,” Opt. Express 17(22), 19476–19485 (2009). [CrossRef] [PubMed]
  16. M. Rang, A. C. Jones, F. Zhou, Z.-Y. Li, B. J. Wiley, Y. Xia, and M. B. Raschke, “Optical near-field mapping of plasmonic nanoprisms,” Nano Lett. 8(10), 3357–3363 (2008). [CrossRef] [PubMed]
  17. L. Zhou, Q. Gan, F. J. Bartoli, and V. Dierolf, “Direct near-field optical imaging of UV bowtie nanoantennas,” Opt. Express 17(22), 20301–20306 (2009). [CrossRef] [PubMed]
  18. J. B. Leen, P. Hansen, Y.-T. Cheng, and L. Hesselink, “Improved focused ion beam fabrication of near-field apertures using a silicon nitride membrane,” Opt. Lett. 33(23), 2827–2829 (2008). [CrossRef] [PubMed]
  19. MicroChemicals GmbH, “Development of Photoresists” (2007) http://www.microchemicals.eu/technical_information/development_photoresist.pdf
  20. K. Morisaki and E. Kawamura, “Lithography process control system,” Microelectron. Eng. 17(1-4), 435–438 (1992). [CrossRef]

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