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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 21 — Oct. 10, 2011
  • pp: 19967–19972

About the influence of Line Edge Roughness on measured effective–CD

Bartosz Bilski, Karsten Frenner, and Wolfgang Osten  »View Author Affiliations

Optics Express, Vol. 19, Issue 21, pp. 19967-19972 (2011)

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Various reports state that Line Edge/Width Roughness (LER/LWR) has a significant impact on the integrated circuits fabricated by means of lithography, hence there is a need to determine the LER in–line so that it never exceeds certain specified limits. In our work we deal with the challenge of measuring LER on 50nm resist gratings using scatterometry. We show by simulation that there is a difference between LER and no–LER scatter signatures which first: depends on the polarization and second: is proportional to the amount of LER. Moreover, we show that the mentioned difference is very specific, that is — a grating with LER acts like a grating without LER but showing another width (CD, Critical Dimension), which we refer–to as effective–CD.

© 2011 OSA

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(120.3940) Instrumentation, measurement, and metrology : Metrology

ToC Category:
Instrumentation, Measurement, and Metrology

Original Manuscript: July 7, 2011
Revised Manuscript: August 24, 2011
Manuscript Accepted: August 24, 2011
Published: September 28, 2011

Bartosz Bilski, Karsten Frenner, and Wolfgang Osten, "About the influence of Line Edge Roughness on measured effective–CD," Opt. Express 19, 19967-19972 (2011)

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