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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 6 — Mar. 14, 2011
  • pp: 5431–5441

Integrating fault tolerance algorithm and circularly polarized ellipsometer for point-of-care applications

Chia-Ming Jan, Yu-Hsun Lee, Kuang-Chong Wu, and Chih-Kung Lee  »View Author Affiliations


Optics Express, Vol. 19, Issue 6, pp. 5431-5441 (2011)
http://dx.doi.org/10.1364/OE.19.005431


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Abstract

A circularly polarized ellipsometer was developed to enable real-time measurements of the optical properties of materials. Using a four photo-detector quadrature configuration, a phase modulated ellipsometer was substantially miniaturized which has the ability to achieve a high precision detection limit. With a proven angular resolution of 0.0001 deg achieved by controlling the relative positions of a triangular prism, a paraboloidal and a spherical mirror pair, this new ellipsometer possesses a higher resolution than traditional complex mechanically controlled configurations. Moreover, the addition of an algorithm, FTA (fault tolerance algorithm) was adopted to compensate for the imperfections of the opto-mechanical system which can decrease system measurement reliability. This newly developed system requires only one millisecond or less to complete the measurement task without having to adopt any other modulation approach. The resolution achieved can be as high as 4x10−7 RIU (refractive index unit) which is highly competitive when compared with other commercially available instruments. Our experimental results agreed well with the simulation data which confirms that our quadrature-based circularly polarized ellipsometer with FTA is an effective tool for precise detection of the optical properties of thin films. It also has the potential to be used to monitor the refractive index change of molecules in liquids.

© 2011 OSA

OCIS Codes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(120.4570) Instrumentation, measurement, and metrology : Optical design of instruments
(260.2130) Physical optics : Ellipsometry and polarimetry

ToC Category:
Optical Devices

History
Original Manuscript: January 4, 2011
Revised Manuscript: February 6, 2011
Manuscript Accepted: February 17, 2011
Published: March 8, 2011

Citation
Chia-Ming Jan, Yu-Hsun Lee, Kuang-Chong Wu, and Chih-Kung Lee, "Integrating fault tolerance algorithm and circularly polarized ellipsometer for point-of-care applications," Opt. Express 19, 5431-5441 (2011)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-19-6-5431


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References

  1. R. M. A. Azzam, and N. M. Bashara, Ellipsometry and Polarized Light (North-Holland Pub. Co., 1977).
  2. H. G. Tompkins, and E. A. Irene, Handbook of Ellipsometry (William Andrew Pub., Springer, 2005).
  3. P. A. Cuypers, W. T. Hermens, and H. C. Hemker, “Ellipsometry as a tool to study protein films at liquid-solid interfaces,” Anal. Biochem. 84(1), 56–67 (1978). [CrossRef] [PubMed]
  4. H. Nygren and M. Stenberg, “Calibration by ellipsometry of the enzyme-linked immunosorbent assay,” J. Immunol. Methods 80(1), 15–24 (1985). [CrossRef] [PubMed]
  5. G. Jin, R. Jansson, and H. Arwin, “Imaging ellipsometry revisited: developments for visualization of thin transparent layers on silicon substrates,” Rev. Sci. Instrum. 67(8), 2930–2936 (1996). [CrossRef]
  6. D. Tanooka, E. Adachi, and K. Nagayama, “Color-imaging ellipsometer: high-speed characterization of in-plane distribution of film thickness at nano-scale,” Jpn. J. Appl. Phys., Part 1 40(2A), 877–880 (2001). [CrossRef]
  7. Q. W. Zhan and J. R. Leger, “High-resolution imaging ellipsometer,” Appl. Opt. 41(22), 4443–4450 (2002). [CrossRef] [PubMed]
  8. W. M. Duncan and S. A. Henck, “In situ spectral ellipsometry for real-time measurement and control,” Appl. Surf. Sci. 63(1-4), 9–16 (1993). [CrossRef]
  9. S. A. Henck, W. M. Duncan, L. M. Lowenstein, and S. W. Butler, “In situ spectral ellipsometry for real-time thickness measurement: etching multilayer stacks,” J. Vac. Sci. Technol. A 11(4), 1179–1185 (1993). [CrossRef]
  10. H. Fujiwara, Spectroscopic Ellipsometry: Principles and Applications (John Wiley & Sons, 2007).
  11. C. K. Lee, W. J. Wu, G. Y. Wu, C. L. Li, Z. D. Chen, and J. Y. Chen, “Design and performance verification of a microscope-based interferometer for miniature-specimen metrology,” Opt. Eng. 44(8), 085602 (2005). [CrossRef]
  12. J. Y. Lee, H. C. Shih, C. T. Hong, and T. K. Chou, “Measurement of refractive index change by surface plasmon resonance and phase quadrature interferometry,” Opt. Commun. 276(2), 283–287 (2007). [CrossRef]
  13. S. Patskovsky, M. Maisonneuve, M. Meunier, and A. V. Kabashin, “Mechanical modulation method for ultrasensitive phase measurements in photonics biosensing,” Opt. Express 16(26), 21305–21314 (2008). [CrossRef] [PubMed]
  14. W. L. Hsu, S. S. Lee, and C. K. Lee, “Ellipsometric surface plasmon resonance,” J. Biomed. Opt. 14(2), 024036 (2009). [CrossRef] [PubMed]
  15. C. K. Lee, T. D. Cheng, S. S. Lee, and C. K. Chang, “Opto-mechatronic configurations to maximize dynamic range and optimize resolution of optical instruments,” Opt. Rev. 16(2), 133–140 (2009). [CrossRef]
  16. W. J. Wu, C. K. Lee, and C. T. Hsieh, “Signal processing algorithms for Doppler effect based nanometer positioning systems,” Jpn. J. Appl. Phys., Part 1 38(3B), 1725–1729 (1999). [CrossRef]
  17. C. M. Jan, Y. H. Lee, and C. K. Lee, “The circular polarization interferometer based surface plasmon biosensor,” Proc. SPIE 7577, 75770B, 75770B-12 (2010). [CrossRef]
  18. Y. Y. Cheng and J. C. Wyant, “Phase shifter calibration in phase-shifting interferometry,” Appl. Opt. 24(18), 3049–3052 (1985). [CrossRef] [PubMed]
  19. P. Hariharan, B. F. Oreb, and T. Eiju, “Digital phase-shifting interferometry: a simple error-compensating phase calculation algorithm,” Appl. Opt. 26(13), 2504–2506 (1987). [CrossRef] [PubMed]
  20. R. Naraoka and K. Kajikawa, “Phase detection of surface plasmon resonance using rotating analyzer method,” Sens. Actuators B Chem. 107(2), 952–956 (2005). [CrossRef]
  21. I. An, Y. Cong, N. V. Nguyen, B. S. Pudliner, and R. W. Collins, “Instrumentation considerations in multichannel ellipsometry for real-time spectroscopy,” Thin Solid Films 206(1-2), 300–305 (1991). [CrossRef]
  22. R. M. A. Azzam and N. M. Bashara, “Analysis of systematic-errors in rotating-analyzer ellipsometers,” J. Opt. Soc. Am. 64(11), 1459–1469 (1974). [CrossRef]
  23. N. V. Nguyen, B. S. Pudliner, I. An, and R. W. Collins, “Error correction for calibration and data reduction in rotating-polarizer ellipsometry - applications to a novel multichannel ellipsometer,” J. Opt. Soc. Am. A 8(6), 919–931 (1991). [CrossRef]
  24. P. Westphal and A. Bornmann, “Biomolecular detection by surface plasmon enhanced ellipsometry,” Sens. Actuators B Chem. 84(2-3), 278–282 (2002). [CrossRef]
  25. J. Homola, “Surface plasmon resonance sensors for detection of chemical and biological species,” Chem. Rev. 108(2), 462–493 (2008). [CrossRef] [PubMed]

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