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Optics Express

Optics Express

  • Editor: C. Martijin de Sterke
  • Vol. 19, Iss. 7 — Mar. 28, 2011
  • pp: 6714–6723

Tunable ultra-deep subwavelength photolithography using a surface plasmon resonant cavity

Weihao Ge, Chinhua Wang, Yinfei Xue, Bing Cao, Baoshun Zhang, and Ke Xu  »View Author Affiliations


Optics Express, Vol. 19, Issue 7, pp. 6714-6723 (2011)
http://dx.doi.org/10.1364/OE.19.006714


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Abstract

Using numerical simulations, we report an observation of a novel tunable ultra-deep subwavelength nanolithography technique using a surface plasmon resonant cavity formed by a metallic grating and a metallic thin-film layer separated by a photoresist layer. The tuning capability is implemented by varying the cavity length, from which surface plasmon interferometric patterns with inherently higher optical resolution than that of conventional surface plasmon techniques are generated in the cavity of photoresist layer. The physical origin of the tunability is analytically confirmed by the dispersion relation derived from the cavity system.

© 2011 OSA

OCIS Codes
(240.6680) Optics at surfaces : Surface plasmons
(110.4235) Imaging systems : Nanolithography
(050.6624) Diffraction and gratings : Subwavelength structures

ToC Category:
Optics at Surfaces

History
Original Manuscript: January 7, 2011
Revised Manuscript: March 7, 2011
Manuscript Accepted: March 13, 2011
Published: March 24, 2011

Citation
Weihao Ge, Chinhua Wang, Yinfei Xue, Bing Cao, Baoshun Zhang, and Ke Xu, "Tunable ultra-deep subwavelength photolithography using a surface plasmon resonant cavity," Opt. Express 19, 6714-6723 (2011)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-19-7-6714


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References

  1. M. Rothschild, T. M. Bloomstein, J. E. Curtin, D. K. Downs, T. H. Fedynyshyn, D. E. Hardy, R. R. Kunz, V. Liberman, J. H. C. Sedlacek, R. S. Uttaro, A. K. Bates, and C. Van Peski, “157 nm: deepest deep ultraviolet yet,” J. Vac. Sci. Technol. B 17(6), 3262–3266 (1999). [CrossRef]
  2. C. W. Gwyn, R. Stulen, D. Sweeney, and D. Attwood, “Extreme ultraviolet lithography,” J. Vac. Sci. Technol. B 16(6), 3142–3149 (1998). [CrossRef]
  3. J. P. Silverman, “Challenges and progress in x-ray lithography,” J. Vac. Sci. Technol. B 16(6), 3137–3141 (1998). [CrossRef]
  4. K. S. Johnson, J. H. Thywissen, N. H. Dekker, K. K. Berggren, A. P. Chu, R. Younkin, and M. Prentiss, “Localization of metastable atom beams with optical standing waves: nanolithography at the heisenberg limit,” Science 280(5369), 1583–1586 (1998). [CrossRef] [PubMed]
  5. C. Vieu, F. Carcenac, A. Pepin, Y. Chen, M. Mejias, A. Lebib, L. Manin-Ferlazzo, L. Couraud, and H. Launois, “Electron beam lithography: resolution limits and applications,” Appl. Surf. Sci. 164(1-4), 111–117 (2000). [CrossRef]
  6. J. Melngailis, A. A. Mondelli, and L. Ivan Berry III andR. Mohondro, “A review of ion projection lithography,” J. Vac. Sci. Technol. B 16(3), 927–957 (1998). [CrossRef]
  7. R. D. Piner, J. Zhu, F. Xu, S. Hong, and C. A. Mirkin, ““Dip-Pen” nanolithography,” Science 283(5402), 661–663 (1999). [CrossRef] [PubMed]
  8. M. C. McAlpine, R. S. Friedman, and C. M. Lieber, “Nanoimprint lithography for hybrid plastic electronics,” Nano Lett. 3(4), 443–445 (2003). [CrossRef]
  9. R. J. Blaikie and S. J. McNab, “Evanescent interferometric lithography,” Appl. Opt. 40(10), 1692–1698 (2001). [CrossRef]
  10. W. L. Barnes, A. Dereux, and T. W. Ebbesen, “Surface plasmon subwavelength optics,” Nature 424(6950), 824–830 (2003). [CrossRef] [PubMed]
  11. W. Srituravanich, N. Fang, C. Sun, Q. Luo, and X. Zhang, “Plasmonic Nanolithography,” Nano Lett. 4(6), 1085–1088 (2004). [CrossRef]
  12. X. Luo and T. Ishihara, “Subwavelength photolithography based on surface-plasmon polariton resonance,” Opt. Express 12(14), 3055–3065 (2004). [CrossRef] [PubMed]
  13. W. Srituravanich, N. Fang, S. Durant, M. Ambati, C. Sun, and X. Zhang, “Sub-100 nm lithography using ultrashort wavelength of surface plasmons,” J. Vac. Sci. Technol. B 22(6), 3475–3478 (2004). [CrossRef]
  14. Z. W. Liu, Q. H. Wei, and X. Zhang, “Surface plasmon interference nanolithography,” Nano Lett. 5(5), 957–961 (2005). [CrossRef] [PubMed]
  15. Z. Liu, Y. Wang, J. Yao, H. Lee, W. Srituravanich, and X. Zhang, “Broad band two-dimensional manipulation of surface plasmons,” Nano Lett. 9(1), 462–466 (2009). [CrossRef]
  16. Y. Xiong, Z. Liu, and X. Zhang, “Projecting deep-subwavelength patterns from diffraction-limited masks using metal-dielectric multilayers,” Appl. Phys. Lett. 93(11), 111116 (2008). [CrossRef]
  17. T. Xu, Y. Zhao, J. Ma, C. Wang, J. Cui, C. Du, and X. Luo, “Sub-diffraction-limited interference photolithography with metamaterials,” Opt. Express 16(18), 13579–13584 (2008). [CrossRef] [PubMed]
  18. X. Yang, B. Zeng, C. Wang, and X. Luo, “Breaking the feature sizes down to sub-22 nm by plasmonic interference lithography using dielectric-metal multilayer,” Opt. Express 17(24), 21560–21565 (2009). [CrossRef] [PubMed]
  19. R. J. Blaikie, M. M. Alkaisi, S. J. McNab, and D. O. S. Melville, “Nanoscale optical patterning using evanescent fields and surface plasmons,” Int. J. Nanoscience 3(4 & 5), 405–417 (2004). [CrossRef]
  20. D. B. Shao and S. C. Chen, “Surface-plasmon-assisted nanoscale photolithography by polarized light,” Appl. Phys. Lett. 86(25), 253107 (2005). [CrossRef]
  21. D. B. Shao and S. C. Chen, “Numerical simulation of surface-plasmon-assisted nanolithography,” Opt. Express 13(18), 6964–6973 (2005). [CrossRef] [PubMed]
  22. M. D. Arnold and R. J. Blaikie, “Subwavelength optical imaging of evanescent fields using reflections from plasmonic slabs,” Opt. Express 15(18), 11542–11552 (2007). [CrossRef] [PubMed]
  23. T. Xu, L. Fang, J. Ma, B. Zeng, Y. Liu, J. Cui, C. Wang, Q. Fang, and X. Luo, “Localizing surface plasmons with a metal-cladding superlens for projecting deep-subwavelength patterns,” Appl. Phys. B 97(1), 175–179 (2009). [CrossRef]
  24. X. Yang, L. Fang, B. Zeng, C. Wang, Q. Feng, and X. Luo, “Deep subwavelength photolithography based on surface plasmon polariton resonance with metallic grating waveguide heterostructure,” J. Opt. 12(4), 045001 (2010). [CrossRef]
  25. N. Fang, H. Lee, C. Sun, and X. Zhang, “Sub-diffraction-limited optical imaging with a silver superlens,” Science 308(5721), 534–537 (2005). [CrossRef] [PubMed]
  26. M. J. Weber, Handbook of Optical Materials (CRC Press, Boca Raton, 2003), Chap.4, pp.352–355.

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