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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 8 — Apr. 11, 2011
  • pp: 7507–7512

Antireflection coatings for deep ultraviolet optics deposited by magnetron sputtering from Al targets

Bo-Huei Liao and Cheng-Chung Lee  »View Author Affiliations

Optics Express, Vol. 19, Issue 8, pp. 7507-7512 (2011)

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We introduce an innovative technique for the deposition of fluorine doped oxide (F:Al2O3) films by DC pulse magnetron sputtering from aluminum targets at room temperature. There was almost no change in transmittance even after the film was exposed to air for two weeks. Its refractive index was around 1.69 and the extinction coefficient was smaller than 1.9 × 10−4 at 193 nm. An AlF3/F:Al2O3 antireflection coating was deposited on both sides of a quartz substrate. A high transmittance of 99.32% was attained at the 193 nm wavelength. The cross-sectional morphology showed that the surface of the multilayer films was smooth and there were no columnar or porous structures.

© 2011 OSA

OCIS Codes
(310.1210) Thin films : Antireflection coatings
(310.1860) Thin films : Deposition and fabrication

ToC Category:
Thin Films

Original Manuscript: February 18, 2011
Revised Manuscript: March 19, 2011
Manuscript Accepted: March 19, 2011
Published: April 4, 2011

Bo-Huei Liao and Cheng-Chung Lee, "Antireflection coatings for deep ultraviolet optics deposited by magnetron sputtering from Al targets," Opt. Express 19, 7507-7512 (2011)

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