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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 9 — Apr. 25, 2011
  • pp: 8684–8692

Optimized electron beam writing strategy for fabricating computer-generated holograms based on an effective medium approach

Wiebke Freese, Thomas Kämpfe, Werner Rockstroh, Ernst-Bernhard Kley, and Andreas Tünnermann  »View Author Affiliations

Optics Express, Vol. 19, Issue 9, pp. 8684-8692 (2011)

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Recent research revealed that using the effective medium approach to generate arbitrary multi-phase level computer-generated holograms is a promising alternative to the conventional multi-height level approach. Although this method reduces the fabrication effort using one-step binary lithography, the subwavelength patterning process remains a huge challenge, particularly for large-scale applications. To reduce the writing time on variable shaped electron beam writing systems, an optimized strategy based on an appropriate reshaping of the binary subwavelength structures is illustrated. This strategy was applied to fabricate a three-phase level CGH in the visible range, showing promising experimental results.

© 2011 OSA

OCIS Codes
(050.1380) Diffraction and gratings : Binary optics
(090.1970) Holography : Diffractive optics
(090.2890) Holography : Holographic optical elements
(050.6624) Diffraction and gratings : Subwavelength structures

ToC Category:

Original Manuscript: January 24, 2011
Revised Manuscript: March 18, 2011
Manuscript Accepted: March 18, 2011
Published: April 19, 2011

Wiebke Freese, Thomas Kämpfe, Werner Rockstroh, Ernst-Bernhard Kley, and Andreas Tünnermann, "Optimized electron beam writing strategy for fabricating computer-generated holograms based on an effective medium approach," Opt. Express 19, 8684-8692 (2011)

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