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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 1 — Jan. 2, 2012
  • pp: 291–298

Enhancement of height resolution in direct laser lithography

Hyug-Gyo Rhee and Yun-Woo Lee  »View Author Affiliations


Optics Express, Vol. 20, Issue 1, pp. 291-298 (2012)
http://dx.doi.org/10.1364/OE.20.000291


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Abstract

To address the requirements of multi-level semiconductors, we propose a new technique for overcoming the height limitation of direct laser lithography. In the proposed system, an original source beam is fed into an interference generator that divides the input beam by 50: 50 into two output beams. After going through an imaging lens, these two beams make two focusing spots, which are slightly separated in the axial direction. In the overlapped region, these two spots generate a small interferogram that shortens the depth of focus. By using this phenomenon, we are able to overcome the height limitation of direct laser lithography. The governing equations are also derived in this manuscript by using the Gaussian beam model.

© 2011 OSA

OCIS Codes
(120.4610) Instrumentation, measurement, and metrology : Optical fabrication
(120.4640) Instrumentation, measurement, and metrology : Optical instruments

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: November 3, 2011
Revised Manuscript: December 1, 2011
Manuscript Accepted: December 2, 2011
Published: December 20, 2011

Citation
Hyug-Gyo Rhee and Yun-Woo Lee, "Enhancement of height resolution in direct laser lithography," Opt. Express 20, 291-298 (2012)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-20-1-291


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References

  1. M. Haruna, M. Takahashi, K. Wakahayashi, and H. Nishihara, “Laser beam lithographed micro-Fresnel lenses,” Appl. Opt.29(34), 5120–5126 (1990). [CrossRef] [PubMed]
  2. M. T. Gale, M. Rossi, J. Pedersen, and H. Schutz, “Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresists,” Opt. Eng.33(11), 3556–3566 (1994). [CrossRef]
  3. A. G. Poleshchuk, E. G. Churin, V. P. Koronkevich, V. P. Korolkov, A. A. Kharissov, V. V. Cherkashin, V. P. Kiryanov, A. V. Kiryanov, S. A. Kokarev, and A. G. Verhoglyad, “Polar coordinate laser pattern generator for fabrication of diffractive optical elements with arbitrary structure,” Appl. Opt.38(8), 1295–1301 (1999). [CrossRef] [PubMed]
  4. J.-M. Asfour and A. G. Poleshchuk, “Asphere testing with a Fizeau interferometer based on a combined computer-generated hologram,” J. Opt. Soc. Am. A23(1), 172–178 (2006). [CrossRef] [PubMed]
  5. J. H. Burge, “Fabrication of large circular diffractive optics,” in Diffractive Optics and Micro-Optics, OSA Tech. Dig. 10 (1998).
  6. H.-G. Rhee and Y.-W. Lee, “Improvement of linewidth in laser beam lithographed computer generated hologram,” Opt. Express18(2), 1734–1740 (2010). [CrossRef] [PubMed]
  7. J. Jin, J. W. Kim, C.-S. Kang, J.-A. Kim, and T. B. Eom, “Thickness and refractive index measurement of a silicon wafer based on an optical comb,” Opt. Express18(17), 18339–18346 (2010). [CrossRef] [PubMed]
  8. J. W. Goodman, “Analog optical information processing,” in Introduction to Fourier Optics, 2nd ed., (McGraw-Hill, Singapore, 1996), Chap. 4.
  9. V. Westphal, C. M. Blanca, M. Dyba, L. Kastrup, and S. W. Hell, “Laser-diode-stimulated emission depletion microscopy,” Appl. Phys. Lett.82(18), 3125–3127 (2003). [CrossRef]
  10. B. E. A. Saleh and M. C. Teich, “Beam optics,” in Fundamentals of Photonics (John Wiley & Sons, Inc., New York, 1991), Chap. 3.
  11. D.-I. Kim, H.-G. Rhee, J.-B. Song, and Y.-W. Lee, “Laser output power stabilization for direct laser writing system by using an acousto-optic modulator,” Rev. Sci. Instrum.78(10), 103110 (2007). [CrossRef] [PubMed]
  12. D. K. Cohen, W. H. Gee, M. Ludeke, and J. Lewkowicz, “Automatic focus control: the astigmatic lens approach,” Appl. Opt.23(4), 565–570 (1984). [CrossRef] [PubMed]
  13. H.-G. Rhee, D.-I. Kim, and Y.-W. Lee, “Realization and performance evaluation of high speed autofocusing for direct laser lithography,” Rev. Sci. Instrum.80(7), 073103 (2009). [CrossRef] [PubMed]
  14. L. Deck and P. de Groot, “High-speed noncontact profiler based on scanning white-light interferometry,” Appl. Opt.33(31), 7334–7338 (1994). [CrossRef] [PubMed]
  15. A. Harasaki, J. Schmit, and J. C. Wyant, “Improved vertical-scanning interferometry,” Appl. Opt.39(13), 2107–2115 (2000). [CrossRef] [PubMed]
  16. G. Binnig, C. F. Quate, and C. Gerber, “Atomic force microscope,” Phys. Rev. Lett.56(9), 930–933 (1986). [CrossRef] [PubMed]
  17. T. Doi, T. V. Vorburger, and P. J. Sullivan, “Effects of defocus and algorithm on optical step height calibration,” Precis. Eng.23(3), 135–143 (1999). [CrossRef]

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