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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 1 — Jan. 2, 2012
  • pp: 698–705

Laser conditioning on HfO2 film monitored by calorimeter

Liu Hao, Chen Songlin, Wei Yaowei, Zhang Zhe, Luo Jin, Zheng Nan, and Ma Ping  »View Author Affiliations

Optics Express, Vol. 20, Issue 1, pp. 698-705 (2012)

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Conditioning effect on HfO2 single-layer film by quasi-cw laser was investigated. The conditioning process was monitored with laser calorimeter. Experimental results revealed that the HfO2 film absorption decreased as a function of the irradiation dose. Higher laser power accelerated the conditioning process. The conditioning effect could not be explained by water annihilation. AFM pictures of the film surface showed that the structural information in the conditioned region was different from the unconditioned region. Monitoring the in situ absorption, laser calorimeter is a promising tool to investigate the laser conditioning process.

© 2011 OSA

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(140.3440) Lasers and laser optics : Laser-induced breakdown

ToC Category:
Lasers and Laser Optics

Original Manuscript: October 14, 2011
Revised Manuscript: December 9, 2011
Manuscript Accepted: December 12, 2011
Published: December 23, 2011

Liu Hao, Chen Songlin, Wei Yaowei, Zhang Zhe, Luo Jin, Zheng Nan, and Ma Ping, "Laser conditioning on HfO2 film monitored by calorimeter," Opt. Express 20, 698-705 (2012)

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  1. C. J. Stolz, C. L. Weinzapfel, A. L. Rigatti, J. B. Oliver, J. Taniguchi, R. P. Bevis, and J. S. Rajasansi, “Fabrication of meter-scale laser-resistant mirrors for the National Ignition Facility, a fusion laser,” Proc. SPIE 5193, 50–58 (2004). [CrossRef]
  2. L. Sheehan, M. Kozlowski, F. Rainer, and M. Staggs, “Large-area conditioning of optics for high-power laser systems,” Proc. SPIE 2114, 559–568 (1994). [CrossRef]
  3. C. J. Stolz, L. M. Sheehan, S. M. Maricle, S. Schwartz, M. R. Kozlowski, R. T. Jennings, and J. Hue, “Laser conditioning methods in hafnia silica multilayer mirrors,” Proc. SPIE 3264, 105–112 (1998). [CrossRef]
  4. Y. A. Zhao, G. H. Hu, J. D. Shao, X. F. Liu, H. B. He, and Z. X. Fan, “Laser conditioning process combining N/1 and S/1 programs to improve the damage resistance of KDP crystals,” Proc. SPIE 7504, 75041L (2009). [CrossRef]
  5. A. B. Papandrew, C. J. Stolz, Z. L. Wu, G. E. Loomis, and S. Falabella, “Laser conditioning characterization and damage threshold prediction of hafnia/silica multilayer mirrors by photothermal microscopy,” Proc. SPIE 4347, 53–61 (2001). [CrossRef]
  6. H. Bercegol, “What is laser conditioning? a review focused on dielectric multilayers,” Proc. SPIE 3578, 421–426 (1999). [CrossRef]
  7. M. R. Kozlowski, M. Staggs, and F. Rainer, “Laser conditioning and electronic defects of HfO2 and SiO2 thin films,” Proc. SPIE 1441, 269–282 (1991). [CrossRef]
  8. R. Wolf, G. Zscherpe, E. Welsch, V. Goepner, and D. Schafer, “Absorption influenced laser damage resistance of Ta2O5 coatings,” Opt. Acta (Lond.) 33(7), 919–924 (1986). [CrossRef]
  9. R. Wolf, G. Zscherpe, E. Welsch, V. Goepner, and D. Schafer, “Ageing influence on the absorption and laser damage resistance of Ta2O5 thin films,” J. Mod. Opt. 34(12), 1585–1588 (1987). [CrossRef]
  10. A. During, M. Commandre, C. Fossati, B. Bertussi, J. Y. Natoli, J. L. Rullier, H. Bercegol, and P. Bouchut, “Integrated photothermal microscope and laser damage test facility for in-situ investigation of nanodefect induced damage,” Opt. Express 11(20), 2497–2501 (2003). [CrossRef] [PubMed]
  11. Z. L. Wu, C. J. Stolz, S. C. Weakley, J. D. Hughes, and Q. Zhao, “Damage threshold prediction of hafnia-silica multilayer coatings by nondestructive evaluation of fluence-limiting defects,” Appl. Opt. 40(12), 1897–1906 (2001). [CrossRef] [PubMed]
  12. S. Papernov, A. Tait, W. Bittle, A. W. Schmid, J. B. Oliver, and P. Kupinski, “Near-ultraviolet absorption and nanosecond-pulse-laser damage in HfO2 monolayers studied by submicrometer-resolution photothermal heterodyne imaging and atomic force microscopy,” J. Appl. Phys. 109(11), 113106 (2011). [CrossRef]
  13. E. Eva, K. Mann, N. Kaiser, B. Anton, R. Henking, D. Ristau, P. Weissbrodt, D. Mademann, L. Raupach, and E. Hacker, “Laser conditioning of LaF3/MgF2 dielectric coatings at 248 nm,” Appl. Opt. 35(28), 5613–5619 (1996). [CrossRef] [PubMed]
  14. ISO 11551: “Optics and optical instruments-Lasers and laser-related equipment-Test method for absorptance of optical laser components” (2003).
  15. U. Willamowski, D. Ristau, and E. Welsch, “Measuring the absolute absorptance of optical laser components,” Appl. Opt. 37(36), 8362–8370 (1998). [CrossRef] [PubMed]
  16. L. O. Jensen, I. Balasa, H. Blaschke, and D. Ristau, “Novel technique for the determination of hydroxyl distributions in fused silica,” Opt. Express 17(19), 17144–17149 (2009). [CrossRef] [PubMed]
  17. G. Duchateau, “Modeling laser conditioning of KDP crystals,” Proc. SPIE 7504, 75041K (2009).

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