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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 13 — Jun. 18, 2012
  • pp: 13857–13869

Second-harmonic generation from electron beam deposited SiO films

Søren Vejling Andersen and Kjeld Pedersen  »View Author Affiliations

Optics Express, Vol. 20, Issue 13, pp. 13857-13869 (2012)

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It is demonstrated that as-grown e-beam deposited SiOx thin films on fused silica substrates show a second-order nonlinear response that is dependent on film thickness. Using a Maker fringes method the effective nonlinear coefficient for a SiO thin film is estimated to be comparable to that of crystalline quartz. Variation of process parameters has been used to investigate the origin of the nonlinear response. The second-harmonic signal is very sensitive to annealing of the film and can be totally removed by annealing at a few hundred degrees. It is also demonstrated that a retarding grid that traps charged particles between the crucible and the sample reduces the nonlinear signal from a SiO thin film significantly. It is suggested that oriented dipoles arise during deposition due to a negatively charged film from oxygen ions, thus, resulting in a non-centrosymmetric film. Finally, using e-beam lithography, well-defined nonlinear 2D structures can be synthesized, thus opening the door to a new and practical way to create nonlinear structures for planar waveguide technology.

© 2012 OSA

OCIS Codes
(160.4330) Materials : Nonlinear optical materials
(190.0190) Nonlinear optics : Nonlinear optics
(190.4360) Nonlinear optics : Nonlinear optics, devices
(310.0310) Thin films : Thin films
(130.2755) Integrated optics : Glass waveguides

ToC Category:
Nonlinear Optics

Original Manuscript: May 9, 2012
Revised Manuscript: May 24, 2012
Manuscript Accepted: May 24, 2012
Published: June 7, 2012

Søren Vejling Andersen and Kjeld Pedersen, "Second-harmonic generation from electron beam deposited SiO films," Opt. Express 20, 13857-13869 (2012)

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