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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 14 — Jul. 2, 2012
  • pp: 15752–15768

Actinic microscope for extreme ultraviolet lithography photomask inspection and review

Michael Goldstein and Patrick Naulleau  »View Author Affiliations


Optics Express, Vol. 20, Issue 14, pp. 15752-15768 (2012)
http://dx.doi.org/10.1364/OE.20.015752


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Abstract

Two dual-configuration extreme ultraviolet (EUV, 13.5nm wavelength) optical designs are described as a means to overcome principal EUV photomask metrology challenges. Semiconductor industry-wide efforts to define performance requirements and create standalone tools that can be used to discover, review, and accurately locate phase, amplitude, and mask pattern defects are described. The reference designs co-optimize low and high magnification configurations for orthogonal chief ray planes to avoid inspection and review trade-offs and emulate the aerial image of a lithography scanner.

© 2012 OSA

OCIS Codes
(220.3620) Optical design and fabrication : Lens system design
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(110.4235) Imaging systems : Nanolithography

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: March 21, 2012
Revised Manuscript: May 4, 2012
Manuscript Accepted: June 15, 2012
Published: June 27, 2012

Citation
Michael Goldstein and Patrick Naulleau, "Actinic microscope for extreme ultraviolet lithography photomask inspection and review," Opt. Express 20, 15752-15768 (2012)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-20-14-15752


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References

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