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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 15 — Jul. 16, 2012
  • pp: 17126–17135

Tailoring diffraction-induced light distribution toward controllable fabrication of suspended C-MEMS

Hu Long, Shuang Xi, Dan Liu, Tielin Shi, Qi Xia, Shiyuan Liu, and Zirong Tang  »View Author Affiliations

Optics Express, Vol. 20, Issue 15, pp. 17126-17135 (2012)

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A simple and controllable method is proposed to fabricate suspended three-dimensional carbon microelectromechanical systems (C-MEMS) structures by tailoring diffraction-induced light distribution in photolithography process. An optical model is set up and the corresponding affecting parameters are analyzed to interpret and predict the formation of suspended structures based on Fresnel diffraction theory. It is identified that mask pattern dimensions, gap distance between the photomask and photoresist, and the exposure time are critical to the final suspended structures, which have also been verified through experimental demonstrations. The fabricated biocompatible suspended C-MEMS structures could find wide applications in electrochemical and biological areas.

© 2012 OSA

OCIS Codes
(050.1940) Diffraction and gratings : Diffraction
(220.4000) Optical design and fabrication : Microstructure fabrication
(050.6875) Diffraction and gratings : Three-dimensional fabrication

ToC Category:
Optical Design and Fabrication

Original Manuscript: May 18, 2012
Revised Manuscript: July 4, 2012
Manuscript Accepted: July 10, 2012
Published: July 12, 2012

Hu Long, Shuang Xi, Dan Liu, Tielin Shi, Qi Xia, Shiyuan Liu, and Zirong Tang, "Tailoring diffraction-induced light distribution toward controllable fabrication of suspended C-MEMS," Opt. Express 20, 17126-17135 (2012)

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  1. C. L. Wang, G. Y. Jia, L. Taherabadi, and M. Madou, “A novel method for the fabrication of high-aspect ratio C-MEMS structures,” J. Microelectromech. Syst.14(2), 348–358 (2005). [CrossRef]
  2. B. Y. Park, L. Taherabadi, C. L. Wang, J. Zoval, and M. Madou, “Electrical properties and shrinkage of carbonized photoresist films and the implications for carbon microelectromechanical systems devices in conductive media,” J. Electrochem. Soc.152(12), J136–J143 (2005). [CrossRef]
  3. D. B. Burckel, C. M. Washburn, A. K. Raub, S. R. J. Brueck, D. R. Wheeler, S. M. Brozik, and R. Polsky, “Lithographically defined porous carbon electrodes,” Small5(24), 2792–2796 (2009). [CrossRef] [PubMed]
  4. C. L. Wang, L. Taherabadi, G. Y. Jia, M. Madou, Y. Yeh, and B. Dunn, “C-MEMS for the manufacture of 3D microbatteries,” Electrochem. Solid-State Lett.7(11), A435–A438 (2004). [CrossRef]
  5. W. Chen, M. Beidaghi, V. Penmatsa, K. Bechtold, L. Kumari, W. Z. Li, and C. L. Wang, “Integration of carbon nanotubes to C-MEMS for on-chip supercapacitors,” IEEE Trans. Nanotechnol.9(6), 734–740 (2010). [CrossRef]
  6. H. Xu, K. Malladi, C. L. Wang, L. Kulinsky, M. Song, and M. Madou, “Carbon post-microarrays for glucose sensors,” Biosens. Bioelectron.23(11), 1637–1644 (2008). [CrossRef] [PubMed]
  7. A. Campo and C. Greiner, “SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography,” J. Micromech. Microeng.17(6), R81–R95 (2007). [CrossRef]
  8. B. Meliorisz and A. Erdmann, “Simulation of mask proximity printing,” J. Micro/Nanolith. MEMS MOEMS.6, 023006 (2007).
  9. W. J. Kang, E. Rabe, S. Kopetz, and A. Neyer, “Novel exposure methods based on reflection and refraction effects in the field of SU-8 lithography,” J. Micromech. Microeng.16(4), 821–831 (2006). [CrossRef]
  10. Y. J. Chuang, F. G. Tseng, and W. K. Lin, “Reduction of diffraction effect of UV exposure on SU-8 negative thick photoresist by air gap elimination,” Microsyst. Technol.8(4-5), 308–313 (2002). [CrossRef]
  11. R. Yang and W. J. Wang, “A numerical and experimental study on gap compensation and wavelength selection in UV-lithography of ultra-high aspect ratio SU-8 microstructures,” Sens. Actuators B Chem.110(2), 279–288 (2005). [CrossRef]
  12. Y. Cheng, C. Y. Lin, D. H. Wei, B. Loechel, and G. Gruetzner, “Wall profile of thick photoresist generated via contact printing,” J. Microelectromech. Syst.8(1), 18–26 (1999). [CrossRef]
  13. Z. R. Tang, T. L. Shi, J. Gong, L. Nie, and S. Y. Liu, “An optimized process for fabrication of high-aspect-ratio photoresist-derived carbon microelectrode array on silicon substrate,” Thin Solid Films518(10), 2701–2706 (2010). [CrossRef]
  14. K. Malladi, C. L. Wang, and M. Madou, “Fabrication of suspended carbon microstructures by e-beam writer and pyrolysis,” Carbon44(13), 2602–2607 (2006). [CrossRef]
  15. K. Y. No, G. D. Kim, and G. M. Kim, “Fabrication of suspended micro-structures using diffsuser lithography on negative photoresist,” J. Mech. Sci. Technol.22(9), 1765–1771 (2008). [CrossRef]
  16. C. S. Sharma, H. Katepalli, A. Sharma, and M. Madou, “Fabrication and electrical conductivity of suspended carbon nanofiber arrays,” Carbon49(5), 1727–1732 (2011). [CrossRef]
  17. N. R. Franklin, Q. Wang, T. W. Tombler, A. Javey, M. Shim, and H. J. Dai, “Integration of suspended carbon nanotube arrays into electronic devices and electromechanical systems,” Appl. Phys. Lett.81(5), 913–915 (2002). [CrossRef]
  18. M. Born and E. Wolf, Principles of Optics (Cambridge University Press, 2003), Chap. 1, 2, 7, 8.
  19. M. Bass and V. N. Mahajan, Handbook of Optics (McGraw-Hill, 2010), Volume I, Chap. 1–3.
  20. M. Gaudet, J. C. Camart, L. Buchaillot, and S. Arscott, “Variation of absorption coefficient and determination of critical dose of SU-8 at 365 nm,” Appl. Phys. Lett.88(2), 024107 (2006). [CrossRef]

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