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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 2 — Jan. 16, 2012
  • pp: 854–863

Characterization of 1064nm nanosecond laser-induced damage on antireflection coatings grown by atomic layer deposition

Zhichao Liu, Songlin Chen, Ping Ma, Yaowei Wei, Yi Zheng, Feng Pan, Hao Liu, and Gengyu Tang  »View Author Affiliations

Optics Express, Vol. 20, Issue 2, pp. 854-863 (2012)

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Damage tests are carried out at 1064nm to measure the laser resistance of TiO2/Al2O3and HfO2/Al2O3 antireflection coatings grown by atomic layer deposition (ALD). The damage results are determined by S-on-1 and R-on-1 tests. Interestingly, the damage performance of ALD coatings is similar to those grown by conventional e-beam evaporation process. A decline law of damage resistance under multiple irradiations is revealed. The influence of growth temperature on damage performance has been investigated. Result shows that the crystallization of TiO2 layer at higher temperature could lead to numerous absorption defects that reduce the laser-induced damage threshold (LIDT). In addition, it has been found that using inorganic compound instead of organic compound as precursors for ALD process maybe effectively prevent carbon impurities in films and will increase the LIDT obviously.

© 2012 OSA

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(310.1210) Thin films : Antireflection coatings

ToC Category:
Thin Films

Original Manuscript: November 22, 2011
Revised Manuscript: December 19, 2011
Manuscript Accepted: December 19, 2011
Published: January 3, 2012

Zhichao Liu, Songlin Chen, Ping Ma, Yaowei Wei, Yi Zheng, Feng Pan, Hao Liu, and Gengyu Tang, "Characterization of 1064nm nanosecond laser-induced damage on antireflection coatings grown by atomic layer deposition," Opt. Express 20, 854-863 (2012)

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