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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 21, Iss. 1 — Jan. 14, 2013
  • pp: 1310–1316

A compact and low loss Y-junction for submicron silicon waveguide

Yi Zhang, Shuyu Yang, Andy Eu-Jin Lim, Guo-Qiang Lo, Christophe Galland, Tom Baehr-Jones, and Michael Hochberg  »View Author Affiliations


Optics Express, Vol. 21, Issue 1, pp. 1310-1316 (2013)
http://dx.doi.org/10.1364/OE.21.001310


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Abstract

We designed a compact, low-loss and wavelength insensitive Y-junction for submicron silicon waveguide using finite difference time-domain (FDTD) simulation and particle swarm optimization (PSO), and fabricated the device in a 248 nm complementary metal-oxide-semiconductor (CMOS) compatible process. Measured average insertion loss is 0.28 ± 0.02 dB, uniform across an 8-inch wafer. The device footprint is less than 1.2 μm x 2 μm, an order of magnitude smaller than typical multimode interferometers (MMIs) and directional couplers.

© 2013 OSA

OCIS Codes
(130.3120) Integrated optics : Integrated optics devices
(230.1360) Optical devices : Beam splitters
(230.7370) Optical devices : Waveguides

ToC Category:
Integrated Optics

History
Original Manuscript: November 8, 2012
Revised Manuscript: December 28, 2012
Manuscript Accepted: December 30, 2012
Published: January 11, 2013

Citation
Yi Zhang, Shuyu Yang, Andy Eu-Jin Lim, Guo-Qiang Lo, Christophe Galland, Tom Baehr-Jones, and Michael Hochberg, "A compact and low loss Y-junction for submicron silicon waveguide," Opt. Express 21, 1310-1316 (2013)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-21-1-1310


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