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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 21, Iss. 18 — Sep. 9, 2013
  • pp: 21523–21529

Design and fabrication of ultra-steep notch filters

Jinlong Zhang, Alexander V. Tikhonravov, Michael K. Trubetskov, Yongli Liu, Xinbin Cheng, and Zhanshan Wang  »View Author Affiliations


Optics Express, Vol. 21, Issue 18, pp. 21523-21529 (2013)
http://dx.doi.org/10.1364/OE.21.021523


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Abstract

We present the design and production approach of an ultra-steep notch filter. The notch filter that does not have thin layers is optimized utilizing the constrained optimization technique, and this is well suitable for accurate monitoring with the electron beam deposition technique. Single layer SiO2 and Ta2O5 films were deposited and carefully characterized in order to determine tooling factors and refractive indices wavelength dependencies accurately. We produced the ultra-steep notch filter with indirect monochromatic monitoring strategy and demonstrated the excellent correspondence to the theoretical spectral performance.

© 2013 OSA

OCIS Codes
(310.1860) Thin films : Deposition and fabrication
(310.6860) Thin films : Thin films, optical properties
(310.4165) Thin films : Multilayer design

ToC Category:
Thin Films

History
Original Manuscript: July 22, 2013
Revised Manuscript: August 27, 2013
Manuscript Accepted: August 27, 2013
Published: September 5, 2013

Citation
Jinlong Zhang, Alexander V. Tikhonravov, Michael K. Trubetskov, Yongli Liu, Xinbin Cheng, and Zhanshan Wang, "Design and fabrication of ultra-steep notch filters," Opt. Express 21, 21523-21529 (2013)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-21-18-21523


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