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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 21, Iss. 21 — Oct. 21, 2013
  • pp: 24490–24496

Nanoscale tensile stress approach for the direct writing of plasmonic nanostructures

Tianrui Zhai, Yuanhai Lin, Hongmei Liu, Shengfei Feng, and Xinping Zhang  »View Author Affiliations


Optics Express, Vol. 21, Issue 21, pp. 24490-24496 (2013)
http://dx.doi.org/10.1364/OE.21.024490


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Abstract

One- and two-dimensional plasmonic nanostructures can be fabricated using nanoscale tensile stress. A polymer layer, coated with a thin metal film, is exposed to an interference pattern produced by ultraviolet laser beams. Crosslinking is induced between the polymeric molecules located within the bright fringes. This process not only increases the refractive index but also reduces the polymer layer thickness. Corrugations occur on the continuous thin metal film due to the nanoscale stress in the polymer layer. Thus, a periodic nanostructure of area 3 × 3 mm and depth 50 nm is created both in the polymer and metal films with excellent homogeneity and reproducibility. This method enables direct writing of a large-area plasmonic nanostructure at low cost which can be used in the design of optoelectronic devices and sensors.

© 2013 Optical Society of America

OCIS Codes
(160.5470) Materials : Polymers
(220.4241) Optical design and fabrication : Nanostructure fabrication
(250.5403) Optoelectronics : Plasmonics

ToC Category:
Plasmonics

History
Original Manuscript: July 18, 2013
Revised Manuscript: September 26, 2013
Manuscript Accepted: September 26, 2013
Published: October 7, 2013

Citation
Tianrui Zhai, Yuanhai Lin, Hongmei Liu, Shengfei Feng, and Xinping Zhang, "Nanoscale tensile stress approach for the direct writing of plasmonic nanostructures," Opt. Express 21, 24490-24496 (2013)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-21-21-24490


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