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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 21, Iss. 23 — Nov. 18, 2013
  • pp: 27852–27864

Structured Mo/Si multilayers for IR-suppression in laser-produced EUV light sources

Marcus Trost, Sven Schröder, Angela Duparré, Stefan Risse, Torsten Feigl, Uwe D. Zeitner, and Andreas Tünnermann  »View Author Affiliations

Optics Express, Vol. 21, Issue 23, pp. 27852-27864 (2013)

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Laser produced plasma sources are considered attractive for high-volume extreme-ultraviolet (EUV) lithography because of their high power at the target wavelength 13.5 nm. However, besides the required EUV light, a large amount of infrared (IR) light from the CO2 drive laser is scattered and reflected from the plasma as well as from the EUV mirrors in the optical system. Since these mirrors typically consist of molybdenum and silicon, the reflectance at IR wavelengths is even higher than in the EUV, which leads to high energy loads in the optical system. One option to reduce this is to structure the EUV multilayer, in particular the collector mirror, with an IR grating that has a high IR-suppression in the zeroth order. In this paper, the characterization of such an optical element is reported, including the IR-diffraction efficiency, the EUV performance (reflectance and scattering), and the relevant surface roughness. The measurement results are directly linked to the individual manufacturing steps.

© 2013 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(120.4290) Instrumentation, measurement, and metrology : Nondestructive testing
(310.1620) Thin films : Interference coatings
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(130.7408) Integrated optics : Wavelength filtering devices

ToC Category:
Thin Films

Original Manuscript: August 12, 2013
Revised Manuscript: October 18, 2013
Manuscript Accepted: October 25, 2013
Published: November 6, 2013

Marcus Trost, Sven Schröder, Angela Duparré, Stefan Risse, Torsten Feigl, Uwe D. Zeitner, and Andreas Tünnermann, "Structured Mo/Si multilayers for IR-suppression in laser-produced EUV light sources," Opt. Express 21, 27852-27864 (2013)

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