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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 21, Iss. 23 — Nov. 18, 2013
  • pp: 27852–27864

Structured Mo/Si multilayers for IR-suppression in laser-produced EUV light sources

Marcus Trost, Sven Schröder, Angela Duparré, Stefan Risse, Torsten Feigl, Uwe D. Zeitner, and Andreas Tünnermann  »View Author Affiliations


Optics Express, Vol. 21, Issue 23, pp. 27852-27864 (2013)
http://dx.doi.org/10.1364/OE.21.027852


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Abstract

Laser produced plasma sources are considered attractive for high-volume extreme-ultraviolet (EUV) lithography because of their high power at the target wavelength 13.5 nm. However, besides the required EUV light, a large amount of infrared (IR) light from the CO2 drive laser is scattered and reflected from the plasma as well as from the EUV mirrors in the optical system. Since these mirrors typically consist of molybdenum and silicon, the reflectance at IR wavelengths is even higher than in the EUV, which leads to high energy loads in the optical system. One option to reduce this is to structure the EUV multilayer, in particular the collector mirror, with an IR grating that has a high IR-suppression in the zeroth order. In this paper, the characterization of such an optical element is reported, including the IR-diffraction efficiency, the EUV performance (reflectance and scattering), and the relevant surface roughness. The measurement results are directly linked to the individual manufacturing steps.

© 2013 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(120.4290) Instrumentation, measurement, and metrology : Nondestructive testing
(310.1620) Thin films : Interference coatings
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(130.7408) Integrated optics : Wavelength filtering devices

ToC Category:
Thin Films

History
Original Manuscript: August 12, 2013
Revised Manuscript: October 18, 2013
Manuscript Accepted: October 25, 2013
Published: November 6, 2013

Citation
Marcus Trost, Sven Schröder, Angela Duparré, Stefan Risse, Torsten Feigl, Uwe D. Zeitner, and Andreas Tünnermann, "Structured Mo/Si multilayers for IR-suppression in laser-produced EUV light sources," Opt. Express 21, 27852-27864 (2013)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-21-23-27852


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References

  1. C. Wagner and H. Noreen, “EUV lithography: lithography gets extreme,” Nat. Photonics4(1), 24–26 (2010). [CrossRef]
  2. I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, and G. O. Vaschenko, “The development of stable EUV sources for use in lithography exposure systems,” J. Micro/Nanolith. MEMS MOEMS11, 021110 (2012). [CrossRef]
  3. Gigaphoton's extreme UV source hits 5.2% efficiency” (optics.org, 05 Jul. 2012), http://optics.org/news/3/7/6
  4. A. E. Yakshin, R. W. E. van de Kruijs, I. Nedelcu, E. Zoethout, E. Louis, F. Bijkerk, H. Enkisch, and S. Müllender, “Enhanced reflectance of interface engineered Mo/Si multilayers produced by thermal particle deposition,” Proc. SPIE6517, 65170I, 65170I-9 (2007). [CrossRef]
  5. T. Feigl, S. Yulin, N. Benoit, and N. Kaiser, “EUV multilayer optics,” Microelectron. Eng.83(4-9), 703–706 (2006). [CrossRef]
  6. C. Mbanaso, A. Antohe, H. Bull, F. Goodwin, A. Hershcovitch, and G. Denbeaux, “Out-of-band radiation mitigation at 10.6 μm by molecular absorbers in laser-produced plasma extreme ultraviolet sources,” J. Micro/nanolith MEMS MOEMS 11, 021116 (2012).
  7. M. S. Bibishkin, N. I. Chkhalo, S. A. Gusev, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, A. E. Pestov, N. N. Salashchenko, L. A. Shmaenok, N. N. Tsybin, and S. Y. Zuev, “Multilayer Zr/Si filters for EUV lithography and for radiation source metrology,” Proc. SPIE7025, 702502, 702502-10 (2008). [CrossRef]
  8. W. A. Soer, M. J. J. Jak, A. M. Yakunin, M. M. J. W. van Herpen, and V. Y. Banine, “Grid spectral purity filters for suppression of infrared radiation in laser-produced plasma EUV sources,” Proc. SPIE7271, 72712Y, 72712Y-9 (2009). [CrossRef]
  9. W. A. Soer, P. Gawlitza, M. M. J. W. van Herpen, M. J. J. Jak, S. Braun, P. Muys, and V. Y. Banine, “Extreme ultraviolet multilayer mirror with near-zero IR reflectance,” Opt. Lett.34(23), 3680–3682 (2009). [CrossRef] [PubMed]
  10. H. Kierey, K. Heidemann, B. Kleemann, R. Winters, W. Egle, W. Singer, F. Melzer, R. Wevers, and M. Antoni, “EUV spectral purity filter: optical and mechanical design, grating fabrication, and testing,” Proc. SPIE5193, 70–78 (2004). [CrossRef]
  11. A. J. R. van den Boogaard, F. A. van Goor, E. Louis, and F. Bijkerk, “Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection,” Opt. Lett.37(2), 160–162 (2012). [CrossRef] [PubMed]
  12. M. G. Moharam and T. K. Gaylord, “Rigorous coupled-wave analysis of planar-grating diffraction,” J. Opt. Soc. Am.71(7), 811–818 (1981). [CrossRef]
  13. V. V. Medvedev, A. J. R. van den Boogaard, R. van der Meer, A. E. Yakshin, E. Louis, V. M. Krivtsun, and F. Bijkerk, “Infrared diffractive filtering for extreme ultraviolet multilayer Bragg reflectors,” Opt. Express21(14), 16964–16974 (2013). [CrossRef] [PubMed]
  14. A. Duparré, J. Ferre-Borrull, S. Gliech, G. Notni, J. Steinert, and J. M. Bennett, “Surface characterization techniques for determining the root-mean-square roughness and power spectral densities of optical components,” Appl. Opt.41(1), 154–171 (2002). [CrossRef] [PubMed]
  15. J. S. Taylor, G. E. Sommargren, E. Gary, D. W. Sweeney, and R. M. Hudyma, “The fabrication and testing of optics for EUV projection lithography,” Proc. SPIE3331, 580–590 (1998). [CrossRef]
  16. M. Trost, S. Schröder, T. Feigl, A. Duparré, and A. Tünnermann, “Roughness characterization of large EUV mirror optics by laser light scattering,” Proc. SPIE8169(81690P), 81690P (2011).
  17. J. C. Stover, Optical Scattering - Measurement and Analysis, 3rd Edition (SPIE Press, Bellingham, WA 2012).
  18. S. Schröder, M. Trost, T. Feigl, A. Duparré, and J. E. Harvey, “Efficient specification and characterization of surface roughness for extreme ultraviolet optics,” Proc. SPIE7969, 79692C, 79692C-8 (2011). [CrossRef]
  19. R. Steinkopf, A. Gebhardt, S. Scheiding, M. Rohde, O. Stenzel, S. Gliech, V. Giggel, H. Löscher, G. Ullrich, P. Rucks, A. Duparré, S. Risse, R. Eberhardt, and A. Tünnermann, “Metal Mirrors with Excellent Figure and Roughness,” Proc. SPIE7102, 71020C, 71020C-12 (2008). [CrossRef]
  20. R. ter Horst, N. Tromp, M. de Haan, R. Navarro, L. Venema, and J. Pragt, “Directly Polished Light Weight Aluminum Mirror,” Proc. SPIE7018, 701808, 701808-10 (2008). [CrossRef]
  21. S. Risse, A. Gebhardt, A. Kolbmüller, R. Steinkopf, M. Schürmann, J. Jobst, N. Kaiser, and R. Eberhardt, “Ultra-precise optical mirrors with thick amorphous silicon layer,“ Proc. 11th int. conf. EUSPEN, Lake Como, Italy, 337-340 (2011).
  22. M. Schürmann, P. J. Jobst, S. Yulin, T. Feigl, H. Heiße, S. Wilbrandt, O. Stenzel, A. Gebhardt, S. Risse, and N. Kaiser, “Optical reflector coatings for astronomical applications from EUV to IR,” Proc. SPIE8450, 84502K, 84502K-8 (2012). [CrossRef]
  23. S. Schröder, T. Herffurth, H. Blaschke, and A. Duparré, “Angle-resolved scattering: an effective method for characterizing thin-film coatings,” Appl. Opt.50(9), C164–C171 (2011). [CrossRef] [PubMed]
  24. T. Herffurth, S. Schröder, M. Trost, A. Duparré, and A. Tünnermann, “Comprehensive nanostructure and defect analysis using a simple 3D light-scatter sensor,” Appl. Opt.52(14), 3279–3287 (2013). [CrossRef] [PubMed]
  25. S. Schröder, M. Trost, T. Herffurth, A. von Finck, and A. Duparré, “Sophisticated light scattering techniques from the VUV to the IR regions,” Proc. SPIE8495, 84950V, 84950V-9 (2012). [CrossRef]
  26. S. Schröder, S. Gliech, and A. Duparré, “Measurement system to determine the total and angle-resolved light scattering of optical components in the deep-ultraviolet and vacuum-ultraviolet spectral regions,” Appl. Opt.44(29), 6093–6107 (2005). [CrossRef] [PubMed]
  27. S. Schröder, T. Herffurth, M. Trost, and A. Duparré, “Angle-resolved scattering and reflectance of extreme-ultraviolet multilayer coatings: measurement and analysis,” Appl. Opt.49(9), 1503–1512 (2010). [CrossRef] [PubMed]
  28. M. Trost, S. Schröder, C. C. Lin, A. Duparré, and A. Tünnermann, “Roughness characterization of EUV multilayer coatings and ultra-smooth surfaces by light scattering,” Proc. SPIE8501, 85010F, 85010F-7 (2012). [CrossRef]
  29. S. Schröder, T. Feigl, A. Duparré, and A. Tünnermann, “EUV reflectance and scattering of Mo/Si multilayers on differently polished substrates,” Opt. Express15(21), 13997–14012 (2007). [CrossRef] [PubMed]
  30. M. Trost, S. Schröder, T. Feigl, A. Duparré, and A. Tünnermann, “Influence of the substrate finish and thin film roughness on the optical performance of Mo/Si multilayers,” Appl. Opt.50(9), C148–C153 (2011). [CrossRef] [PubMed]
  31. T. Feigl, M. Perske, H. Pauer, T. Fiedler, S. Yulin, M. Trost, S. Schröder, A. Duparré, N. Kaiser, A. Tünnermann, N. R. Böwering, A. I. Ershov, K. Hoffmann, B. La Fontaine, and K. D. Cummings, “Optical performance of LPP multilayer collector mirrors,” Proc. SPIE8322, 832217, 832217-8 (2012). [CrossRef]
  32. E. L. Church, “Fractal surface finish,” Appl. Opt.27(8), 1518–1526 (1988). [CrossRef] [PubMed]

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