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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 21, Iss. 8 — Apr. 22, 2013
  • pp: 9664–9673

Polarization insensitive silicon immersion grating based on total internal reflection

Yuichi Higuchi, Yuzo Ishii, Koichi Hadama, Joji Yamaguchi, and Tsuyoshi Yamamoto  »View Author Affiliations


Optics Express, Vol. 21, Issue 8, pp. 9664-9673 (2013)
http://dx.doi.org/10.1364/OE.21.009664


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Abstract

We describe an immersion grating (IG) with both low polarization-dependent loss (PDL) and high diffraction efficiency. Our immersion grating consists of a silicon (Si) prism and a Si grating coated with dielectric film. We analyze the effect of the refractive index of dielectric film and clarify the refractive index ratio between a Si grating and dielectric film. Selecting an adequate material for the dielectric film, we design the diffraction efficiency of TM polarization without changing that of TE polarization. The simulation results for the optimized IG show a PDL of 0.2 dB and diffraction efficiency of −0.4 dB. A prototype with high dispersion power provides a low PDL of 0.6 dB, while maintaining a high diffraction efficiency of −0.4 dB.

© 2013 OSA

OCIS Codes
(050.0050) Diffraction and gratings : Diffraction and gratings
(050.1950) Diffraction and gratings : Diffraction gratings

ToC Category:
Diffraction and Gratings

History
Original Manuscript: January 31, 2013
Revised Manuscript: March 21, 2013
Manuscript Accepted: March 24, 2013
Published: April 11, 2013

Citation
Yuichi Higuchi, Yuzo Ishii, Koichi Hadama, Joji Yamaguchi, and Tsuyoshi Yamamoto, "Polarization insensitive silicon immersion grating based on total internal reflection," Opt. Express 21, 9664-9673 (2013)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-21-8-9664


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References

  1. K. Suzuki, T. Mizuno, M. Oguma, T. Shibata, H. Takahashi, Y. Hibino, and A. Himeno, “Low loss fully reconfigurable wavelength-selective optical 1×N switch based on transversal filter configuration using silica-based planar lightwave circuit,” IEEE Photon. Technol. Lett.15, 138–140 (2003).
  2. Y. Ishii, K. Hadama, J. Yamaguchi, Y. Kawajiri, E. Hashimoto, T. Matsuura, and F. Shimokawa, “MEMS-based 1x43 Wavelength-Selective Switch with Flat Passband,” in Proceedings of 35th European Conference on Optical Communication, (Vienna, Austria, 2009), paper PD 1.9.
  3. G. Wiedemann and D. E. Jennings, “Immersion grating for infrared astronomy,” Appl. Opt.32(7), 1176–1178 (1993). [CrossRef] [PubMed]
  4. P. J. Kuzmenko, D. R. Ciarlo, and C. G. Stevens, “Fabrication and testing of a silicon immersion grating for infrared spectroscopy,” Proc. SPIE2266, 566–577 (1994). [CrossRef]
  5. J. P. Marsh, D. J. Mar, and D. T. Jaffe, “Production and evaluation of silicon immersion gratings for infrared astronomy,” Appl. Opt.46(17), 3400–3416 (2007). [CrossRef] [PubMed]
  6. E. Popov, J. Hoose, B. Frankel, C. Keast, M. Fritze, T. Y. Fan, D. Yost, and S. Rabe, “Low polarization dependent diffraction grating for wavelength demultimlexing,” Opt. Express12(2), 269–275 (2004). [CrossRef] [PubMed]
  7. J. R. Marciante and D. H. Raguin, “High-efficiency, high-dispersion diffraction gratings based on total internal reflection,” Opt. Lett.29(6), 542–544 (2004). [CrossRef] [PubMed]
  8. Y. Ikeda, N. Kobayashi, H. Terada, A. Shibayama, A. Ozawa, C. Yasui, S. Kondo, T. S. Pyo, and H. Kawakita, “High-efficiency silicon immersion grating by electron-beam lithography,” Proc. SPIE7014, 701469, 701469-12 (2008). [CrossRef]
  9. Rsoft Design Group, “DiffractMOD”, http://www.rsoftdesign.com .
  10. S. Wang, C. Zhou, Y. Zhang, and H. Ru, “Deep-etched high-density fused-silica transmission gratings with high efficiency at a wavelength of 1550 nm,” Appl. Opt.45(12), 2567–2571 (2006). [CrossRef] [PubMed]
  11. M. Shimbo, K. Furukawa, K. Fukuda, and K. Tanzawa, “Silicon-to-silicon direct bonding method,” J. Appl. Phys.60(8), 2987–2989 (1986). [CrossRef]

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