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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 21, Iss. 8 — Apr. 22, 2013
  • pp: 9664–9673

Polarization insensitive silicon immersion grating based on total internal reflection

Yuichi Higuchi, Yuzo Ishii, Koichi Hadama, Joji Yamaguchi, and Tsuyoshi Yamamoto  »View Author Affiliations

Optics Express, Vol. 21, Issue 8, pp. 9664-9673 (2013)

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We describe an immersion grating (IG) with both low polarization-dependent loss (PDL) and high diffraction efficiency. Our immersion grating consists of a silicon (Si) prism and a Si grating coated with dielectric film. We analyze the effect of the refractive index of dielectric film and clarify the refractive index ratio between a Si grating and dielectric film. Selecting an adequate material for the dielectric film, we design the diffraction efficiency of TM polarization without changing that of TE polarization. The simulation results for the optimized IG show a PDL of 0.2 dB and diffraction efficiency of −0.4 dB. A prototype with high dispersion power provides a low PDL of 0.6 dB, while maintaining a high diffraction efficiency of −0.4 dB.

© 2013 OSA

OCIS Codes
(050.0050) Diffraction and gratings : Diffraction and gratings
(050.1950) Diffraction and gratings : Diffraction gratings

ToC Category:
Diffraction and Gratings

Original Manuscript: January 31, 2013
Revised Manuscript: March 21, 2013
Manuscript Accepted: March 24, 2013
Published: April 11, 2013

Yuichi Higuchi, Yuzo Ishii, Koichi Hadama, Joji Yamaguchi, and Tsuyoshi Yamamoto, "Polarization insensitive silicon immersion grating based on total internal reflection," Opt. Express 21, 9664-9673 (2013)

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