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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 22, Iss. 7 — Apr. 7, 2014
  • pp: 7644–7656

Enhancing surface plasmon leakage at the metal/semiconductor interface: towards increased light outcoupling efficiency in organic optoelectronics

Jesse Kohl, Joseph A. Pantina, and Deirdre M. O’Carroll  »View Author Affiliations


Optics Express, Vol. 22, Issue 7, pp. 7644-7656 (2014)
http://dx.doi.org/10.1364/OE.22.007644


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Abstract

The light outcoupling efficiency of organic light-emitting optoelectronic devices is severely limited by excitation of tightly bound surface plasmon polaritons at the metal electrodes. We present a theoretical study of an organic semiconductor-silver-SiO2 waveguide and demonstrate that by simple tuning of metal film thickness and the emission regime of the organic semiconductor, a significant fraction of surface plasmon polariton mode amplitude is leaked into the active semiconductor layer, thereby decreasing the amount of optical energy trapped by the metal. At visible wavelengths, mode leakage increases by factors of up to 3.8 and 88 by tuning metal film thickness and by addition of gain, respectively.

© 2014 Optical Society of America

OCIS Codes
(230.0250) Optical devices : Optoelectronics
(230.3670) Optical devices : Light-emitting diodes
(240.6680) Optics at surfaces : Surface plasmons
(250.3680) Optoelectronics : Light-emitting polymers
(250.5403) Optoelectronics : Plasmonics

ToC Category:
Plasmonics

History
Original Manuscript: July 15, 2013
Revised Manuscript: October 2, 2013
Manuscript Accepted: November 1, 2013
Published: March 26, 2014

Citation
Jesse Kohl, Joseph A. Pantina, and Deirdre M. O’Carroll, "Enhancing surface plasmon leakage at the metal/semiconductor interface: towards increased light outcoupling efficiency in organic optoelectronics," Opt. Express 22, 7644-7656 (2014)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-22-7-7644


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