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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 10, Iss. 14 — Jul. 15, 2002
  • pp: 586–590

High sensitive SiO2/TiO2 hybrid sol-gel material for fabrication of 3 dimensional continuous surface relief diffractive optical elements by electron-beam lithography

W. C. Cheong, X.-C. Yuan, V. Koudriachov, and W. X. Yu  »View Author Affiliations


Optics Express, Vol. 10, Issue 14, pp. 586-590 (2002)
http://dx.doi.org/10.1364/OE.10.000586


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Abstract

A negative-tone sensitive SiO2/TiO2 organic-inorganic hybrid sol-gel material was synthesized and characterized for fabrication of multilevel micro-optical elements by direct electron-beam lithography. The exposure was carried out by an in-house modified electron-beam writing system using LEO SEM-982 with Elphy Quantum exposure beam-blanking control system at 25keV. The hybrid Sol-Gel material demonstrated a superb sensitivity for doses between 0.22μC/cm2 and 0.33μC/cm2.

© 2002 Optical Society of America

OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(160.6060) Materials : Solgel

ToC Category:
Research Papers

History
Original Manuscript: May 22, 2002
Revised Manuscript: June 16, 2002
Published: July 15, 2002

Citation
W. Cheong, Larry Yuan, V. Koudriachov, and W. Yu, "High sensitive SiO2/TiO2 hybrid sol-gel material for fabrication of 3 dimensional continuous surface relief diffractive optical elements by electron-beam lithography," Opt. Express 10, 586-590 (2002)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-10-14-586


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References

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