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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 10, Iss. 20 — Oct. 7, 2002
  • pp: 1043–1047

Lithographic fabrication of large diffractive optical elements on a concave lens surface

Yongjun Xie, Zhenwu Lu, Fengyou Li, Jingli Zhao, and Zhicheng Weng  »View Author Affiliations

Optics Express, Vol. 10, Issue 20, pp. 1043-1047 (2002)

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We demonstrate experimentally the lithography technique to fabricate a large computer-generated diffractive optical element (DOE) pattern on a concave lens surface with precise alignment by using a laser direct writer. We obtained photoresist film with uniform thickness on the large concave substrate by selecting proper spin-coating parameters, which mainly involve spin rate, spin acceleration, and viscosity of the photoresist. We obtained a square line profile on the concave lens surface. We can write lines that range in width from 0.7 to 10 μm using a single pass of the laser beam. We have designed and fabricated a grating on the concave lens surface using the laser direct writing lithography technique. It is believed that this technique can also transfer large DOE patterns, with a continuous surface relief, onto a convex or concave lens (mirror) surface.

© 2002 Optical Society of America

OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(220.3740) Optical design and fabrication : Lithography

ToC Category:
Research Papers

Original Manuscript: July 23, 2002
Revised Manuscript: September 3, 2002
Published: October 7, 2002

Yongjun Xie, Zhenwu Lu, Fengyou Li, Jingli Zhao, and Zhicheng Weng, "Lithographic fabrication of large diffractive optical elements on a concave lens surface," Opt. Express 10, 1043-1047 (2002)

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