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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 11, Iss. 10 — May. 19, 2003
  • pp: 1144–1148

Single-step photopatterning of diffraction gratings in highly photosensitive hybrid sol-gel films

Dong Jun Kang, Jang-Ung Park, Byeong-Soo Bae, Junji Nishii, and Kenji Kintaka  »View Author Affiliations


Optics Express, Vol. 11, Issue 10, pp. 1144-1148 (2003)
http://dx.doi.org/10.1364/OE.11.001144


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Abstract

Inorganic-organic hybrid materials prepared by a sol-gel process showed a large photoinduced negative refractive-index change (2×10-2) and a volume change. Diffraction gratings were made directly by irradiation with a KrF excimer laser (248 nm) through a phase mask without any etching process. The dependence of diffraction efficiency on irradiation conditions was investigated. The maximum diffraction efficiency, measured by the Littrow configuration with a He-Ne laser (633 nm), was 3.4% in reflection mode.

© 2003 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(140.2180) Lasers and laser optics : Excimer lasers
(160.6060) Materials : Solgel
(220.4610) Optical design and fabrication : Optical fabrication

ToC Category:
Research Papers

History
Original Manuscript: March 31, 2003
Revised Manuscript: April 16, 2003
Published: May 19, 2003

Citation
Dong Jun Kang, Jang-Ung Park, Byeong-Soo Bae, Junji Nishii, and Kenji Kintaka, "Single-step photopatterning of diffraction," Opt. Express 11, 1144-1148 (2003)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-11-10-1144


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