Single-mask microfabrication of aspherical optics using KOH anisotropic etching of Si
Optics Express, Vol. 11, Issue 18, pp. 2244-2252 (2003)
http://dx.doi.org/10.1364/OE.11.002244
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Abstract
We report on the microfabrication of continuous aspherical optical surfaces with a single-mask process, using anisotropic etching of silicon in a KOH water solution. Precise arbitrary aspherical surfaces with lateral scales on the order of several millimeters and a profile depth on the order of several micrometers were fabricated using this process. We discuss the factors defining the precision of the formed component and the resulting surface quality. We demonstrate 1 mm and 5 mm replicated aspherical phase plates, reproducing defocus, tilt, astigmatism and high-order aberrations. The technology has a potential for serial production of reflective and refractive arbitrary aspherical micro-optical components.
© 2003 Optical Society of America
OCIS Codes
(220.1000) Optical design and fabrication : Aberration compensation
(220.1250) Optical design and fabrication : Aspherics
(220.3620) Optical design and fabrication : Lens system design
(220.4000) Optical design and fabrication : Microstructure fabrication
(220.4610) Optical design and fabrication : Optical fabrication
(350.3850) Other areas of optics : Materials processing
ToC Category:
Research Papers
History
Original Manuscript: June 26, 2003
Revised Manuscript: September 1, 2003
Published: September 8, 2003
Citation
D. W. de Lima Monteiro, O. Akhzar-Mehr, P. M. Sarro, and G. Vdovin, "Single-mask microfabrication of aspherical optics using KOH anisotropic etching of Si," Opt. Express 11, 2244-2252 (2003)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-11-18-2244
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References
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