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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 11, Iss. 21 — Oct. 20, 2003
  • pp: 2646–2653

Thermal-induced optical properties of a PdOx mask layer in an optical data storage system with a superresolution near-field structure

Q. Liu, J. Kim, T. Fukaya, and J. Tominaga  »View Author Affiliations

Optics Express, Vol. 11, Issue 21, pp. 2646-2653 (2003)

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Optical-thermal and thermal-optical properties of a PdO x mask layer in a system with a superresolution near-field structure are investigated with a Z-scan technique and a heating experiment. The high photothermal stability of the PdO x mask is shown, and the reversible limit of the PdO x mask layer and a weak switch effect are revealed. The PdO x decomposition, which results in a bubble with Pd particles, is confirmed, and the laser-induced physical and chemical mechanisms in the PdO x mask layer are clarified and discussed. Our microscopic studies and heating analysis are consistent with the Z-scan results. The PdO x mask sample is also compared briefly with a PtO2 mask layer that has the same structure.

© 2003 Optical Society of America

OCIS Codes
(190.4400) Nonlinear optics : Nonlinear optics, materials
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Research Papers

Original Manuscript: August 6, 2003
Revised Manuscript: September 23, 2003
Published: October 20, 2003

Qian Liu, J. Kim, T. Fukaya, and J. Tominaga, "Thermal-induced optical properties of a PdOx mask layer in an optical data storage system with a superresolution near-field structure," Opt. Express 11, 2646-2653 (2003)

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