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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 11, Iss. 8 — Apr. 21, 2003
  • pp: 899–903

Fabrication of refractive microlens in hybrid SiO2/TiO2 sol-gel glass by electron beam lithography

W. X. Yu and X.-C. Yuan  »View Author Affiliations


Optics Express, Vol. 11, Issue 8, pp. 899-903 (2003)
http://dx.doi.org/10.1364/OE.11.000899


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Abstract

We present the fabrication of a refractive microlens in hybrid SiO2/TiO2 sol-gel glass by electron beam lithography. The hybrid sol-gel material has high transmittance (greater than 95%) in the wavelength range from 362nm to 2000nm. Under the electron beam exposure, the polymerized film thickness was as large as 4 µm. A 3D microlens profile can be formed by exposure of the sol-gel film under different electron dosages that leads to different polymerized film thickness after development. As an example, a microlens with a 250 µm diameter and a 2.05 µm sag height was fabricated.

© 2003 Optical Society of America

OCIS Codes
(160.6060) Materials : Solgel
(220.4000) Optical design and fabrication : Microstructure fabrication

ToC Category:
Research Papers

History
Original Manuscript: April 7, 2003
Revised Manuscript: April 9, 2003
Published: April 21, 2003

Citation
W. Yu and X. Yuan, "Fabrication of refractive microlens in hybrid SiO2/TiO2 sol-gel glass by electron beam lithography," Opt. Express 11, 899-903 (2003)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-11-8-899


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References

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