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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 11, Iss. 8 — Apr. 21, 2003
  • pp: 919–926

Single-element elliptical hard x-ray micro-optics

Kenneth Evans-Lutterodt, James M. Ablett, Aaron Stein, Chi-Chang Kao, Donald M. Tennant, Fred Klemens, Ashley Taylor, Chris Jacobsen, Peter L. Gammel, Harold Huggins, Scott Ustin, Greg Bogart, and Leo Ocola  »View Author Affiliations

Optics Express, Vol. 11, Issue 8, pp. 919-926 (2003)

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Using micro-fabrication techniques, we have manufactured a single element kinoform lens in single-crystal silicon with an elliptical profile for 12.398 keV (1Å) x-rays. By fabricating a lens that is optimized at fixed wavelengths, absorption in the lens material can be significantly reduced by removing 2π phase-shifting regions. This permits short focal length devices to be fabricated with small radii of curvatures at the lens apex. This feature allows one to obtain a high demagnification of a finite synchrotron electron source size. The reduced absorption loss also enables optics with a larger aperture, and hence improved resolution for focussing and imaging applications. Our first trial of these lenses has resulted in a one micron line focus (fwhm) at the National Synchrotron Light Source X13B beamline.

© 2003 Optical Society of America

OCIS Codes
(220.3630) Optical design and fabrication : Lenses
(340.0340) X-ray optics : X-ray optics

ToC Category:
Research Papers

Original Manuscript: March 13, 2003
Revised Manuscript: April 9, 2003
Published: April 21, 2003

Kenneth Evans-Lutterodt, James Ablett, Aaron Stein, Chi-Chang Kao, Don Tennant, Fred Klemens, Ashley Taylor, Chris Jacobsen, Peter Gammel, Harold Huggins, Greg Bogart, Scott Ustin, and Leo Ocola, "Single-element elliptical hard x-ray micro-optics," Opt. Express 11, 919-926 (2003)

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