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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 11, Iss. 9 — May. 5, 2003
  • pp: 1070–1079

Femtosecond laser irradiation stress induced in pure silica

B. Poumellec, L. Sudrie, M. Franco, B. Prade, and A. Mysyrowicz  »View Author Affiliations


Optics Express, Vol. 11, Issue 9, pp. 1070-1079 (2003)
http://dx.doi.org/10.1364/OE.11.001070


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Abstract

We reveal stress fields induced by femtosecond laser irradiation by investigating the topography of surface relaxation of a cleavage of silica plates in which irradiation was performed, varying intensity, laser polarization and displacement of the writing beam. The stress field appears to depend on the writing parameters differently according to the laser intensity. For pulse intensity larger than 0.1 µJ, a first shear stress developed. Above 0.25 µJ, another shear stress appears that is dependent on the direction of writing and coupling with a phase matching condition between the pump wave and the third harmonic.

© 2003 Optical Society of America

OCIS Codes
(160.2750) Materials : Glass and other amorphous materials
(190.4720) Nonlinear optics : Optical nonlinearities of condensed matter
(350.3450) Other areas of optics : Laser-induced chemistry

ToC Category:
Research Papers

History
Original Manuscript: February 28, 2003
Revised Manuscript: April 24, 2003
Published: May 5, 2003

Citation
B. Poumellec, L. Sudrie, M. Franco, B. Prade, and A. Mysyrowicz, "Femtosecond laser irradiation stress induced in pure silica," Opt. Express 11, 1070-1079 (2003)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-11-9-1070


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References

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