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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 12, Iss. 14 — Jul. 12, 2004
  • pp: 3055–3065

Subwavelength photolithography based on surface-plasmon polariton resonance

Xiangang Luo and Teruya Ishihara  »View Author Affiliations

Optics Express, Vol. 12, Issue 14, pp. 3055-3065 (2004)

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The use of surface-plasmon polariton (SPP) resonance in the optical near field of a metallic mask to produce fine patterns with a resolution of subwavelength scale is proposed. Preliminary numerical simulations indicate that the critical resolution is determined mainly by the thickness of the metallic mask. The surface of the metallic mask on the illuminated side collects light through SPP coupling, and the interference of SPPs on the exit side of the metallic mask results in enhanced optical intensity with high spatial resolution, which can facilitate nanolithography efficiently by use of conventional photoresist with simple visible or ultraviolet light sources. Several schemes for sub-half-wavelength lithography based on SPPs are described. Inasmuch as the technique is not diffraction limited, nanostructures can be reproduced photolithographically.

© 2004 Optical Society of America

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(220.4000) Optical design and fabrication : Microstructure fabrication
(240.6680) Optics at surfaces : Surface plasmons
(260.0260) Physical optics : Physical optics
(260.2110) Physical optics : Electromagnetic optics
(290.0290) Scattering : Scattering
(350.3950) Other areas of optics : Micro-optics
(350.4600) Other areas of optics : Optical engineering

ToC Category:
Research Papers

Original Manuscript: April 23, 2004
Revised Manuscript: June 15, 2004
Published: July 12, 2004

Xiangang Luo and Teruya Ishihara, "Subwavelength photolithography based on surface-plasmon polariton resonance," Opt. Express 12, 3055-3065 (2004)

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