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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 12, Iss. 16 — Aug. 9, 2004
  • pp: 3707–3712

Spontaneously generated sinusoidallike structures on Ti–Ni thin film under focused ion-beam bombardment

Yongqi Fu and Ngoi Kok Ann Bryan  »View Author Affiliations

Optics Express, Vol. 12, Issue 16, pp. 3707-3712 (2004)

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A new fabrication method for a sinusoidallike structure is described. The sinusoidal structure can be spontaneously self-formed on the surface of a substrate by focused ion-beam bombardment with raster scanning and an ion incident angle perpendicular to the sample surface (normal incidence). The substrate material is a silicon wafer coated with 2-µm-thick Ti–Ni thin film. We show by measurement and analysis of the grating characteristics at the working wavelength range from 50 to 1500 nm that the technique of self-organized formation is a valid approach for microfabrication of diffractive structures, and the spontaneously generated structure under ion bombardment is applicable for a sinusoidal grating that functions from the ultraviolet to the near-infrared wavelength range.

© 2004 Optical Society of America

OCIS Codes
(040.3060) Detectors : Infrared
(050.0050) Diffraction and gratings : Diffraction and gratings
(050.1970) Diffraction and gratings : Diffractive optics
(220.0220) Optical design and fabrication : Optical design and fabrication

ToC Category:
Research Papers

Original Manuscript: June 14, 2004
Revised Manuscript: July 1, 2004
Published: August 9, 2004

Yongqi Fu and Ngoi Bryan, "Spontaneously generated sinusoidallike structures on Ti�??Ni thin film under focused ion-beam bombardment," Opt. Express 12, 3707-3712 (2004)

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  1. T. Geue, O. Henneberg, and U. Pietsch, ???X-ray reflectivity from sinusoidal surface relief gratings,??? Cryst. Res. Technol. 37, 770???776 (2002). [CrossRef]
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