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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 12, Iss. 20 — Oct. 4, 2004
  • pp: 4675–4680

Low propagation loss of the waveguides in fused quartz by oxygen ion implantation

Xue-Lin Wang, Ke-Ming Wang, Gang Fu, Shi-Ling Li, Ding-Yu Shen, Hong-Ji Ma, and Rui Nie  »View Author Affiliations

Optics Express, Vol. 12, Issue 20, pp. 4675-4680 (2004)

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The planar waveguides have been fabricated in fused quartz by 3.0 MeV oxygen ion implantation at dose of 1×1015ions/cm2. The guiding modes were observed at wavelengths of both 633 nm and 1539 nm before and after annealing at 320°C, 450°C and 500°C in 60 min characterized by the prism-coupling method. The width of the waveguide structure induced by oxygen ion implantation is about 3 microns. After suitable annealing, the minimum propagation loss of the waveguide in fused quartz can be reduced to -0.14 dB/cm.

© 2004 Optical Society of America

OCIS Codes
(130.2790) Integrated optics : Guided waves
(160.2750) Materials : Glass and other amorphous materials
(230.7390) Optical devices : Waveguides, planar

ToC Category:
Research Papers

Original Manuscript: August 11, 2004
Revised Manuscript: September 15, 2004
Published: October 4, 2004

Xue-Lin Wang, Ke-Ming Wang, Gang Fu, Shi-Ling Li, Ding-Yu Shen, Hong-Ji Ma, and Rui Nie, "Low propagation loss of the waveguides in fused quartz by oxygen ion implantation," Opt. Express 12, 4675-4680 (2004)

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