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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 12, Iss. 20 — Oct. 4, 2004
  • pp: 4698–4708

Characterization of thermally poled germanosilicate thin films

A. Ozcan, M. J. F. Digonnet, G. S. Kino, F. Ay, and A. Aydinli  »View Author Affiliations

Optics Express, Vol. 12, Issue 20, pp. 4698-4708 (2004)

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We report measurements of the nonlinearity profile of thermally poled low-loss germanosilicate films deposited on fused-silica substrates by PECVD, of interest as potential electro-optic devices. The profiles of films grown and poled under various conditions all exhibit a sharp peak ~0.5 μm beneath the anode surface, followed by a weaker pedestal of approximately constant amplitude down to a depth of 13–16 μm, without the sign reversal typical of poled undoped fused silica. These features suggest that during poling, the films significantly slow down the injection of positive ions into the structure. After local optimization, we demonstrate a record peak nonlinear coefficient of ~1.6 pm/V, approximately twice as strong as the highest reliable value reported in thermally poled fused silica glass, a significant improvement that was qualitatively expected from the presence of Ge.

© 2004 Optical Society of America

OCIS Codes
(190.4400) Nonlinear optics : Nonlinear optics, materials
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Research Papers

Original Manuscript: August 13, 2004
Revised Manuscript: September 15, 2004
Published: October 4, 2004

A. Ozcan, M. Digonnet, G. Kino, F. Ay, and A. Aydinli, "Characterization of thermally poled germanosilicate thin films," Opt. Express 12, 4698-4708 (2004)

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