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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 12, Iss. 23 — Nov. 15, 2004
  • pp: 5735–5740

Nonlinear optical lithography with ultra-high sub-Rayleigh resolution

Sean J. Bentley and Robert W. Boyd  »View Author Affiliations


Optics Express, Vol. 12, Issue 23, pp. 5735-5740 (2004)
http://dx.doi.org/10.1364/OPEX.12.005735


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Abstract

A nonlinear optical, interferometric method for improving the resolution of a lithographic system by an arbitrarily large factor with high visibility is described. The technique is implemented experimentally for both two-fold and three-fold enhancement of the resolution with respect to the traditional Rayleigh limit. In these experiments, an N-photon-absorption recording medium is simulated by Nth harmonic generation followed by a CCD camera. This technique does not exploit quantum features of light; this fact suggests that the improved resolution achieved through use of “quantum lithography” results primarily from the nonlinear response of the recording medium and not from quantum features of the light field.

© 2004 Optical Society of America

OCIS Codes
(110.5220) Imaging systems : Photolithography
(190.4180) Nonlinear optics : Multiphoton processes

ToC Category:
Research Papers

History
Original Manuscript: September 8, 2004
Revised Manuscript: November 7, 2004
Published: November 15, 2004

Citation
Sean Bentley and Robert Boyd, "Nonlinear optical lithography with ultra-high sub-Rayleigh resolution," Opt. Express 12, 5735-5740 (2004)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-12-23-5735


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