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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 12, Iss. 23 — Nov. 15, 2004
  • pp: 5770–5776

Hydrogen loading and UV-irradiation induced etch rate changes in phosphorus-doped fibers

F. Dürr, G. Kulik, H. G. Limberger, R. P. Salathé, S. L. Semjonov, and E. M. Dianov  »View Author Affiliations


Optics Express, Vol. 12, Issue 23, pp. 5770-5776 (2004)
http://dx.doi.org/10.1364/OPEX.12.005770


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Abstract

Abstract We show strong changes in chemical etching of phosphorus-doped fiber cores due to hydrogen loading and subsequent UV-irradiation using an atomic force microscope. The etch rate of the fiber core in a low concentration hydrofluoric acid solution (HF) is decreasing after hydrogen loading by as much as 30%. In contrast, UV-irradiation of the hydrogenated fiber increases the core etch rate to values of 27% above the etch rate of the pristine fiber. The UV-induced change in etch rate does not depend on pulse fluence, but only on total dose. We attribute the changes in etch rate to a hydrogen- and radiation-induced modification of color center population.

© 2004 Optical Society of America

OCIS Codes
(060.2270) Fiber optics and optical communications : Fiber characterization
(160.2750) Materials : Glass and other amorphous materials

ToC Category:
Research Papers

History
Original Manuscript: October 5, 2004
Revised Manuscript: November 8, 2004
Published: November 15, 2004

Citation
F. Dürr, G. Kulik, H. Limberger, R. Salathé, S. Semjonov, and E. Dianov, "Hydrogen loading and UV-irradiation induced etch rate changes in phosphorus-doped fibers," Opt. Express 12, 5770-5776 (2004)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-12-23-5770


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