Low-voltage planar-waveguide electrooptic prism scanner in Crystal-Ion-Sliced thin-film LiNbO3
Optics Express, Vol. 12, Issue 25, pp. 6159-6164 (2004)
http://dx.doi.org/10.1364/OPEX.12.006159
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Abstract
We report on the use of thin, i.e. 10µm-thick, single-crystal LiNbO3, in low-voltage electrooptic prism scanners. These devices are fabricated by electric-field poling of a series of electrooptic prisms in a bulk crystal followed by high-energy ion implantation and subsequent etching of the poled samples. Such a single-crystal thin-film scanner, while having the same scanning functionality as with a bulk device, has an order-of-magnitude reduction in its required voltage; for example, a series of two prisms, of 2mm in total length, yields a deflection angle of 0.7° at 100V compared to more than 1.7kV for the same device in standard 200µm-thick LiNbO3 wafers.
© 2004 Optical Society of America
OCIS Codes
(130.3120) Integrated optics : Integrated optics devices
(130.3730) Integrated optics : Lithium niobate
(230.2090) Optical devices : Electro-optical devices
(230.7390) Optical devices : Waveguides, planar
ToC Category:
Research Papers
History
Original Manuscript: November 4, 2004
Revised Manuscript: November 27, 2004
Published: December 13, 2004
Citation
Djordje Djukic, Ryan Roth, James Yardley, Richard Osgood, Jr., Sasha Bakhru, and Hassaram Bakhru, "Low-voltage planar-waveguide electrooptic prism scanner in Crystal-Ion-Sliced thin-film LiNbO3," Opt. Express 12, 6159-6164 (2004)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-12-25-6159
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References
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