Superfocusing of light below the diffraction limit by photonic crystals with negative refraction
Optics Express, Vol. 12, Issue 26, pp. 6491-6497 (2004)
http://dx.doi.org/10.1364/OPEX.12.006491
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Abstract
Usual optical elements cannot focus a light beam to a spot with diameter smaller than half of the wavelength of the light; however overcoming this limit is of great importance in several applications in high-tech, such as optical lithography or magneto-optical date storage and numerous other fields of science and industry. Here we show that it is possible to focus light to spots below the diffraction limit (superfocusing) by the combination of two main elements: one which creates weak near-field evanescent components of the beam, like a wavelength-scale aperture, and an amplifier of these evanescent fields, like a slab of a photonic crystal with negative refraction.
© 2004 Optical Society of America
OCIS Codes
(070.2580) Fourier optics and signal processing : Paraxial wave optics
(220.2560) Optical design and fabrication : Propagating methods
ToC Category:
Research Papers
History
Original Manuscript: October 11, 2004
Revised Manuscript: December 1, 2004
Published: December 27, 2004
Citation
A. Husakou and J. Herrmann, "Superfocusing of light below the diffraction limit by photonic crystals with negative refraction," Opt. Express 12, 6491-6497 (2004)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-12-26-6491
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References
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