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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 12, Iss. 26 — Dec. 27, 2004
  • pp: 6589–6593

Semiconductor hollow optical waveguides formed by omni-directional reflectors

Shih-Shou Lo, Mou-Sian Wang, and Chii-Chang Chen  »View Author Affiliations


Optics Express, Vol. 12, Issue 26, pp. 6589-6593 (2004)
http://dx.doi.org/10.1364/OPEX.12.006589


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Abstract

In this study, a hollow optical waveguide with omni-directional reflectors in silicon-based materials was design, fabricated and characterized. By using dry etching technique, plasma-enhanced chemical vapor deposition for Si/SiO2 thin films and covering another wafer with omni-directional reflector together, the waveguides can be formed with an air core of 1.2mm×1.3mm. A uniform propagation loss of the waveguide to be around 1.7dB/cm for C+L band was found for the TE and TM modes. Polarization-independent hollow optical waveguides were obtained with the hollow waveguide structure.

© 2004 Optical Society of America

OCIS Codes
(130.3120) Integrated optics : Integrated optics devices
(230.7370) Optical devices : Waveguides

ToC Category:
Research Papers

History
Original Manuscript: November 3, 2004
Revised Manuscript: December 8, 2004
Published: December 27, 2004

Citation
Shih-Shou Lo, Mou-Sian Wang, and Chii-Chang Chen, "Semiconductor hollow optical waveguides formed by omni-directional reflectors," Opt. Express 12, 6589-6593 (2004)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-12-26-6589


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