Quantum lithography by coherent control of classical light pulses
Optics Express, Vol. 12, Issue 26, pp. 6600-6605 (2004)
http://dx.doi.org/10.1364/OPEX.12.006600
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Abstract
The smallest spot in optical lithography and microscopy is generally limited by diffraction. Quantum lithography, which utilizes interference between groups of N entangled photons, was recently proposed to beat the diffraction limit by a factor N. Here we propose a simple method to obtain N photons interference with classical pulses that excite a narrow multiphoton transition, thus shifting the “quantum weight” from the electromagnetic field to the lithographic material. We show how a practical complete lithographic scheme can be developed and demonstrate the underlying principles experimentally by two-photon interference in atomic Rubidium, to obtain focal spots that beat the diffraction limit by a factor of 2.
© 2004 Optical Society of America
OCIS Codes
(020.4180) Atomic and molecular physics : Multiphoton processes
(110.5220) Imaging systems : Photolithography
(180.0180) Microscopy : Microscopy
(320.7110) Ultrafast optics : Ultrafast nonlinear optics
ToC Category:
Research Papers
History
Original Manuscript: November 19, 2004
Revised Manuscript: December 14, 2004
Published: December 27, 2004
Citation
Avi Pe'er, Barak Dayan, Marija Vucelja, Yaron Silberberg, and Asher Friesem, "Quantum lithography by coherent control of classical light pulses," Opt. Express 12, 6600-6605 (2004)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-12-26-6600
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