Exposure-schedule study of uniform diffraction efficiency for DSSM holographic storage
Optics Express, Vol. 12, Issue 6, pp. 984-989 (2004)
http://dx.doi.org/10.1364/OPEX.12.000984
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Abstract
Abstract An exposure-schedule theory of uniform diffraction efficiency for a Dynamic-Static speckle multiplexing (DSSM) volume holographic storage system is proposed. The overlap-factor γoverlap is introduced into the system to compensate for the erasure effect of the static speckle multiplexing scheme. The exposure-schedule which is an inverse recursion formula is determined. Experimental results are obtained in a LiNbO3:Fe crystal and 400 holograms with uniform diffraction efficiency are achieved by the use of the new exposure-schedule.
© 2004 Optical Society of America
OCIS Codes
(030.6140) Coherence and statistical optics : Speckle
(210.2860) Optical data storage : Holographic and volume memories
ToC Category:
Research Papers
History
Original Manuscript: January 12, 2004
Revised Manuscript: March 5, 2004
Published: March 22, 2004
Citation
Xiaosu Ma, Qingsheng He, Jinnan Wang, Minxian Wu, and Guofan Jin, "Exposure-schedule study of uniform diffraction efficiency for DSSM holographic storage," Opt. Express 12, 984-989 (2004)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-12-6-984
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References
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