Basic structures for photonic integrated circuits in Silicon-on-insulator
Optics Express, Vol. 12, Issue 8, pp. 1583-1591 (2004)
http://dx.doi.org/10.1364/OPEX.12.001583
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Abstract
For the compact integration of photonic circuits, wavelength-scale structures with a high index contrast are a key requirement. We developed a fabrication process for these nanophotonic structures in Silicon-on-insulator using CMOS processing techniques based on deep UV lithography. We have fabricated both photonic wires and photonic crystal waveguides and show that, with the same fabrication technique, photonic wires have much less propagation loss than photonic crystal waveguides. Measurements show losses of 0.24dB/mm for photonic wires, and 7.5dB/mm for photonic crystal waveguides. To tackle the coupling to fiber, we studied and fabricated vertical fiber couplers with coupling efficiencies of over 21%. In addition, we demonstrate integrated compact spot-size converters with a mode-to-mode coupling efficiency of over 70%.
© 2004 Optical Society of America
OCIS Codes
(220.4610) Optical design and fabrication : Optical fabrication
(250.5300) Optoelectronics : Photonic integrated circuits
ToC Category:
Focus Issue: Photonic crystals and holey fibers
History
Original Manuscript: March 1, 2004
Revised Manuscript: March 26, 2004
Published: April 19, 2004
Citation
W. Bogaerts, D. Taillaert, B. Luyssaert, P. Dumon, J. Van Campenhout, P. Bienstman, D. Van Thourhout, R. Baets, V. Wiaux, and S. Beckx, "Basic structures for photonic integrated circuits in Silicon-on-insulator," Opt. Express 12, 1583-1591 (2004)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-12-8-1583
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References
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