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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 12, Iss. 9 — May. 3, 2004
  • pp: 1803–1809

Quasi-direct writing of diffractive structures with a focused ion beam

Yongqi Fu, Ngoi Kok Ann Bryan, and Wei Zhou  »View Author Affiliations

Optics Express, Vol. 12, Issue 9, pp. 1803-1809 (2004)

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A new method for fabrication of diffractive structures, which we call quasi-direct writing, is illustrated. The diffractive structures can be generated by changing the pixel spacing along the direction of the cross scan (with zero overlap) and keeping the pixel spacing constant along the other scan direction, with a normal overlap of 50%–60%, while the substrate surface is scanned with a focused ion beam (FIB). Quasi-direct writing is a method for achieving special customer designs when the milling machine has no computer programming function. Diffractive structures with various periods and depths can be derived by controlling the parameters of pixel spacing, beam current, ion incidence angle, and the scan time or ion dose. The method is not restricted to any one material and can be used for metals, insulators, and semiconductors.

© 2004 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(220.4000) Optical design and fabrication : Microstructure fabrication

ToC Category:
Research Papers

Original Manuscript: March 22, 2004
Revised Manuscript: April 5, 2004
Published: May 3, 2004

Yongqi Fu, Ngoi Bryan, and Wei Zhou, "Quasi-direct writing of diffractive structures with a focused ion beam," Opt. Express 12, 1803-1809 (2004)

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