Reflection mode imaging with nanoscale resolution using a compact extreme ultraviolet laser
Optics Express, Vol. 13, Issue 11, pp. 3983-3988 (2005)
http://dx.doi.org/10.1364/OPEX.13.003983
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Abstract
We report the demonstration of reflection mode imaging of 100 nm-scale features using 46.9 nm light from a compact capillary-discharge laser. Our imaging system employs a Sc/Si multilayer coated Schwarzschild condenser and a freestanding zone plate objective. The reported results advance the development of practical and readily available surface and nanostructure imaging tools based on the use of compact sources of extreme ultraviolet light.
© 2005 Optical Society of America
OCIS Codes
(110.7440) Imaging systems : X-ray imaging
(140.7240) Lasers and laser optics : UV, EUV, and X-ray lasers
(180.7460) Microscopy : X-ray microscopy
ToC Category:
Research Papers
History
Original Manuscript: March 2, 2005
Revised Manuscript: May 13, 2005
Published: May 30, 2005
Citation
F. Brizuela, G. Vaschenko, C. Brewer, M. Grisham, C. Menoni, M. Marconi, J. Rocca, W. Chao, J. Liddle, E. Anderson, D. Attwood, A. Vinogradov, I. Artioukov, Y. Pershyn, and V. Kondratenko, "Reflection mode imaging with nanoscale resolution using a compact extreme ultraviolet laser," Opt. Express 13, 3983-3988 (2005)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-13-11-3983
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