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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 13, Iss. 13 — Jun. 27, 2005
  • pp: 5093–5099

Formation of c-axis oriented ZnO optical waveguides by radio-frequency magnetron sputtering

Chuan-Lei Jia, Ke-Ming Wang, Xue-Lin Wang, Xi-Jian Zhang, and Fei Lu  »View Author Affiliations

Optics Express, Vol. 13, Issue 13, pp. 5093-5099 (2005)

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ZnO/Mg0.16Zn0.84O (ZnO/MgZnO) films are fabricated on x-cut and z-cut LiNbO3 (LN) substrates by radio-frequency magnetron sputtering. High transparencies are confirmed by a spectrophotometer. X-ray diffraction (XRD) spectra show that all the films are c-axis oriented. The waveguiding properties, as well as the refractive indices and thickness of the films are demonstrated and determined by prism coupling. Both transverse electric (TE) and transverse magnetic (TM) modes are measured at λ=0.633 µm and 1.539 µm, respectively. The waveguide loss is measured at λ=0.633 µm with a fiber probe technique. The experimental results show that high optical quality ZnO films can be obtained with MgZnO buffer layers.

© 2005 Optical Society of America

OCIS Codes
(160.4670) Materials : Optical materials
(310.6860) Thin films : Thin films, optical properties
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)

ToC Category:
Research Papers

Original Manuscript: April 22, 2005
Revised Manuscript: June 18, 2005
Published: June 27, 2005

Chuan-Lei Jia, Ke-Ming Wang, Xue-Lin Wang, Xi-Jian Zhang, and Fei Lu, "Formation of c-axis oriented ZnO optical waveguides by radio-frequency magnetron sputtering," Opt. Express 13, 5093-5099 (2005)

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  1. Y. F. Chen, D. M. Bagnall, H. Ko. K. Park, K. Hiraga, Z. Zhu, and T. Yao, �??Plasma assited molecular beam epitaxy of ZnO on c-plane sapphire: Growth and characterization,�?? J. Appl. Phys. 84, 3912-3918 (1998). [CrossRef]
  2. R.Ondo-Ndong, F. Pascal-Delannoy, A. Boyer, A. Giani, and A. Foucaran, �??Structural properties of zinc oxide thin films prepared by r. f. magnetron sputtering,�?? Mat. Sci. Eng. B 97, 68-73 (2003). [CrossRef]
  3. K. Matsubara, P. Fons, A. Yamada, M. Watanabe, and S. Niki, �??Epitaxial growth of ZnO thin films on LiNbO3 substrates,�?? Thin Solid Films 347, 238-240 (1998). [CrossRef]
  4. H. Kato, K. Miyamoto, M. Sano, and T. Yao, �??Polarity control of Zno sapphire by the MgO buffer layer thickness,�?? Appl. Phys. Lett. 84, 4562-4564 (2004). [CrossRef]
  5. W. S. Hu, Z. G. Liu, X. L. Guo, C. Lin, S. N. Zhu, and D. Feng, �??Preparation of c-axis oriented ZnO optical waveguiding films on fused silica by pulsed laser reactive ablation,�?? Mater. Lett. 25, 5-8 (1995). [CrossRef]
  6. N. Mails, J. P. Reithmaier, A. Forchel, M. Kohls, L. Spanhel, and G. Müller, �??Er doped nanocrystalline ZnO planar waveguide structures for 1.55μm amplifier applications,�?? Appl. Phys. Lett. 75, 2005-2007 (1999). [CrossRef]
  7. S. F. Yu, C. Yuen, S. P. Lau, Y. G. Wang, H. W. Lee, and B. K. Tay, �??Ultraviolet amplified spontaneous emission from zinc oxide ridge waveguides,�?? Appl. Phys. Lett. 83, 4288-4290 (2003). [CrossRef]
  8. N. Mehan, V. Gupta, K. Sreenivas, and A. Mansingh, �??Effect of annealing on refractive indices of radio-frequency magnetron sputtered waveguiding zinc oxide films on glass,�?? J. Appl. Phys. 96, 3134-3139 (2004). [CrossRef]
  9. R. D. Shannon, �??Revised effective ionic radii and systematic studies of interatomic distances in halides and chalcogenides,�?? Acta Crystallogr. A 32, 751-767 (1976). [CrossRef]
  10. C. W. Teng, J. F. Muth, �?. �?zgür, M. J. Bergmann, H. O. Everitt, A. K. Sharma, C. Jin, and J. Narayan, �??Refractive indices and absorption coefficients of MgxZn1-xO alloys,�?? Appl. Phys. Lett. 76, 979-981 (1999). [CrossRef]
  11. F. Reizman, �??Optical Thickness Measurement of Thin Transparent Films on Silicon,�?? J. Appl. Phys. 36, 3804-3807 (1965). [CrossRef]
  12. H. Yamamoto, N. Saiga and K. Nishimori, �??ZnO thin films deposited on various LiNbO3 substrates by RF-sputtering,�?? Appl. Surf. Sci. 169-170, 517 -520 (2001). [CrossRef]
  13. L.V. Azaroff, Elements of X-ray Crystallography (McGraw-Hill, New York, 1968).
  14. P. D. Townsend, P. J. Chandler, and L. Zhang, Optical Effects of Ion Implantation (Cambridge University Press, Cambridge, UK, 1994). [CrossRef]
  15. A. Ghatak, and K. Thyagarajan, Integrated Optics in Optical Electronics (Cambridge University Press, New Delhi, 1994).
  16. V. Gupta and A. Mansingh, �??Influence of postdeposition annealing on the structural and optical properties of sputtered zinc oxide film,�?? J. Appl. Phys. 80, 1063-1073 (1996). [CrossRef]
  17. A. Dietrich, K. Schmalzbauer, and H. Hoffman, �??The effect of annealing on the optical properties of indium tin oxide films,�?? Thin Solid Films 122, 19-29 (1984). [CrossRef]

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