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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 13, Iss. 14 — Jul. 11, 2005
  • pp: 5331–5337

Rapid fabrication of large-area periodic structures containing well-defined defects by combining holography and mask techniques

Ngoc Diep Lai, Wen Ping Liang, Jian Hung Lin, and Chia Chen Hsu  »View Author Affiliations

Optics Express, Vol. 13, Issue 14, pp. 5331-5337 (2005)

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We demonstrate a promising method to fabricate large-area periodic structures with desired defects by using the combination of multiple-exposure two-beam interference and mask-photolithography techniques. Multiple-exposure of two-beam interference pattern at 325 nm into a positive AZ-4620 (or a negative SU-8) photopolymerizable photoresist is used to form a square and hexagonal two-dimensional periodic structures. Desired defects are introduced in these structures by irradiating the sample with one beam of the same laser through a mask in which the design of defects is patterned. A 1cm×1cm periodic structures with the lattice constant as small as 365nm embedding several kinds of defect, such as waveguide or Mach-Zehnder, was obtained by employing this combination technique. It shows that the proposed combination technique is useful for mass production of photonic crystal optoelectronics devices.

© 2005 Optical Society of America

OCIS Codes
(090.0090) Holography : Holography
(220.3740) Optical design and fabrication : Lithography
(220.4000) Optical design and fabrication : Microstructure fabrication
(260.3160) Physical optics : Interference
(310.2790) Thin films : Guided waves

ToC Category:
Research Papers

Original Manuscript: June 3, 2005
Revised Manuscript: June 24, 2005
Published: July 11, 2005

Ngoc Diep Lai, Wen Liang, Jian Lin, and Chia Hsu, "Rapid fabrication of large-area periodic structures containing well-defined defects by combining holography and mask techniques," Opt. Express 13, 5331-5337 (2005)

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