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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 13, Iss. 16 — Aug. 8, 2005
  • pp: 6259–6267

Soft-lithography-based optical interconnection with high misalignment tolerance

Junhao Wu, Jing Wu, Junfeng Bao, and X. Wu  »View Author Affiliations


Optics Express, Vol. 13, Issue 16, pp. 6259-6267 (2005)
http://dx.doi.org/10.1364/OPEX.13.006259


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Abstract

A low-cost, versatile optical coupling structure featuring a monolithic integration of a polymeric waveguide, beam ducts, and end-reflectors has been designed, prototyped, and demonstrated to be capable of sustaining high misalignment errors whilst maintaining a reasonable coupling efficiency. The soft lithography fabrication process of this interconnection design allows for significant advantages over traditional designs in terms of misalignment tolerance, manufacture cost and speed, as well as 3-D integration capability.

© 2005 Optical Society of America

OCIS Codes
(230.7370) Optical devices : Waveguides
(250.5300) Optoelectronics : Photonic integrated circuits
(250.5460) Optoelectronics : Polymer waveguides

ToC Category:
Research Papers

History
Original Manuscript: July 11, 2005
Revised Manuscript: July 30, 2005
Published: August 8, 2005

Citation
Junhao Wu, Jing Wu, Junfeng Bao, and X. Wu, "Soft-lithography-based optical interconnection with high misalignment tolerance," Opt. Express 13, 6259-6267 (2005)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-13-16-6259


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