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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 13, Iss. 17 — Aug. 22, 2005
  • pp: 6445–6453

Microstructure of femtosecond laser-induced grating in amorphous silicon

Geon Joon Lee, Jisun Park, Eun Kyu Kim, YoungPak Lee, Kyung Moon Kim, Hyeonsik Cheong, Chong Seung Yoon, Yong-Duck Son, and Jin Jang  »View Author Affiliations


Optics Express, Vol. 13, Issue 17, pp. 6445-6453 (2005)
http://dx.doi.org/10.1364/OPEX.13.006445


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Abstract

The femtosecond laser-induced grating (FLIG) formation and crystallization were investigated in amorphous silicon (a-Si) films, prepared on glass by plasma-enhanced chemical-vapor deposition. Probe-beam diffraction, micro-Raman spectroscopy, atomic force microscopy, scanning electron microscopy, and transmission electron microscopy were employed to characterize the diffraction properties and the microstructures of FLIGs. It was found that i) the FLIG can be regarded as a pattern of alternating a-Si and microcrystalline-silicon (μc-Si) lines with a period of about 2 μm, and ii) efficient grating formation and crystallization were achieved by high-intensity recording with a short writing period.

© 2005 Optical Society of America

OCIS Codes
(050.0050) Diffraction and gratings : Diffraction and gratings
(160.2750) Materials : Glass and other amorphous materials
(300.6450) Spectroscopy : Spectroscopy, Raman
(320.7090) Ultrafast optics : Ultrafast lasers

ToC Category:
Research Papers

History
Original Manuscript: June 15, 2005
Revised Manuscript: August 5, 2005
Published: August 22, 2005

Citation
Geon Joon Lee, Jisun Park, Eun Kim, YoungPak Lee, Kyung Kim, Hyeonsik Cheong, Chong Yoon, Yong-Duck Son, and Jin Jang, "Microstructure of femtosecond laser-induced grating in amorphous silicon," Opt. Express 13, 6445-6453 (2005)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-13-17-6445


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