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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 13, Iss. 18 — Sep. 5, 2005
  • pp: 7091–7096

Quasi-phase-matched second-harmonic generation in Ge-ion implanted fused silica channel waveguide

Shiuh Chao, Huai-Yi Chen, Yu-Hsien Yang, Ze-Wen Wang, Chih Shih, and Huan Niu  »View Author Affiliations

Optics Express, Vol. 13, Issue 18, pp. 7091-7096 (2005)

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Channel waveguides were formed on fused silica substrate by Ge-ion implantation with lithographically defined channels. Thermal poling was performed to form second order optical nonlinearity (SON) in the waveguides. Periodical photo masks were designed and fabricated on a mask glass. Periodical erasure of the SON in the channel waveguides by 266 nm UV light with the photo mask on the fused silica substrate produced periodical SON distribution in the waveguides. First order quasi-phase-matching second-harmonic generation from 1064 nm to 532 nm was demonstrated in the channel waveguides.

© 2005 Optical Society of America

OCIS Codes
(190.2620) Nonlinear optics : Harmonic generation and mixing
(190.4360) Nonlinear optics : Nonlinear optics, devices
(190.4400) Nonlinear optics : Nonlinear optics, materials

ToC Category:
Research Papers

Original Manuscript: July 18, 2005
Revised Manuscript: August 27, 2005
Published: September 5, 2005

Shiuh Chao, Huai-Yi Chen, Yu-Hsien Yang, Ze-Wen Wang, Chih Shih, and Huan Niu, "Quasi-phase-matched second-harmonic generation in Ge-ion implanted fused silica channel waveguide," Opt. Express 13, 7091-7096 (2005)

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