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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 13, Iss. 25 — Dec. 12, 2005
  • pp: 10163–10171

Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm

J. Neauport, L. Lamaignere, H. Bercegol, F. Pilon, and J.-C. Birolleau  »View Author Affiliations


Optics Express, Vol. 13, Issue 25, pp. 10163-10171 (2005)
http://dx.doi.org/10.1364/OPEX.13.010163


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Abstract

In this paper we study the effect of contamination induced by fabrication process on laser damage density of fused silica polished parts at 351 nm in nanosecond regime. We show, owing to recent developments of our raster scan metrology, that a good correlation exists between damage density and concentration of certain contaminants for the considered parts.

© 2005 Optical Society of America

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(160.2750) Materials : Glass and other amorphous materials
(220.5450) Optical design and fabrication : Polishing
(240.5450) Optics at surfaces : Polishing

ToC Category:
Research Papers

Citation
J. Neauport, L. Lamaignere, H. Bercegol, F. Pilon, and J.-C. Birolleau, "Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm," Opt. Express 13, 10163-10171 (2005)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-13-25-10163


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