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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 13, Iss. 5 — Mar. 7, 2005
  • pp: 1353–1360

Control approach for form accuracy of microlenses with continuous relief

Xiaochun Dong, Chunlei Du, Shuhong Li, Changtao Wang, and Yongqi Fu  »View Author Affiliations


Optics Express, Vol. 13, Issue 5, pp. 1353-1360 (2005)
http://dx.doi.org/10.1364/OPEX.13.001353


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Abstract

We describe a novel control approach for form accuracy of microlenses with continuous relief by control of exposure threshold. The approach can be achieved by analysis of the exposure distribution on photoresist and by deriving a relationship between the exposure distributions and the internal photoactive compound concentration (PAC) of the photoresist. The feature of parallel PAC curves for a specific value is determined in this way. We then analyze the development process and discover its critical effect on the approach. Finally we establish the relationship between the PAC distribution and the form accuracy of the relief. Not only is the fabricated relief height significantly increased to as high as 100 µm by use of this method, but we also realized effective fine control of the form accuracy of the continuous relief. With this approach we obtained micro-optic elements with 100-µm relief height and a form error (rms value) of less than 1 µm.

© 2005 Optical Society of America

OCIS Codes
(080.3630) Geometric optics : Lenses
(110.3960) Imaging systems : Microlithography
(220.4000) Optical design and fabrication : Microstructure fabrication

ToC Category:
Research Papers

History
Original Manuscript: December 16, 2004
Revised Manuscript: February 6, 2005
Published: March 7, 2005

Citation
Xiaochun Dong, Chunlei Du, Shuhong Li, Changtao Wang, and Yongqi Fu, "Control approach for form accuracy of microlenses with continuous relief," Opt. Express 13, 1353-1360 (2005)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-13-5-1353


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References

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