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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 13, Iss. 5 — Mar. 7, 2005
  • pp: 1515–1530

Beyond the Rayleigh scattering limit in high-Q silicon microdisks: theory and experiment

Matthew Borselli, Thomas J. Johnson, and Oskar Painter  »View Author Affiliations

Optics Express, Vol. 13, Issue 5, pp. 1515-1530 (2005)

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Using a combination of resist reflow to form a highly circular etch mask pattern and a low-damage plasma dry etch, high-quality-factor silicon optical microdisk resonators are fabricated out of silicon-oninsulator (SOI) wafers. Quality factors as high as Q=5×106 are measured in these microresonators, corresponding to a propagation loss coefficient as small as α~0.1 dB/cm. The different optical loss mechanisms are identified through a study of the total optical loss, mode coupling, and thermally-induced optical bistability as a function of microdisk radius (5-30 µm). These measurements indicate that optical loss in these high-Q microresonators is limited not by surface roughness, but rather by surface state absorption and bulk free-carrier absorption.

© 2005 Optical Society of America

OCIS Codes
(190.1450) Nonlinear optics : Bistability
(190.4870) Nonlinear optics : Photothermal effects
(230.5750) Optical devices : Resonators

ToC Category:
Research Papers

Original Manuscript: February 2, 2005
Revised Manuscript: February 21, 2005
Published: March 7, 2005

Matthew Borselli, Thomas Johnson, and Oskar Painter, "Beyond the Rayleigh scattering limit in high-Q silicon microdisks: theory and experiment," Opt. Express 13, 1515-1530 (2005)

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