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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 13, Iss. 6 — Mar. 21, 2005
  • pp: 2127–2134

Super-resolution imaging through a planar silver layer

David O. S. Melville and Richard J. Blaikie  »View Author Affiliations

Optics Express, Vol. 13, Issue 6, pp. 2127-2134 (2005)

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It has been proposed that a planar silver layer could be used to project a super-resolution image in the near field when illuminated near its plasma frequency [J. B. Pendry, Phys. Rev. Lett. 86, 3966 (2000)]. This has been investigated experimentally using a modified form of conformal-mask photolithography, where dielectric spacers and silver layers are coated onto a tungsten-on-glass mask. We report here on the experimental confirmation that super-resolution imaging can be achieved using a 50-nm thick planar silver layer as a near-field lens at wavelengths around 365 nm. Gratings with periods down to 145 nm have been resolved, which agrees well with our finite-difference time domain (FDTD) simulations.

© 2005 Optical Society of America

OCIS Codes
(100.6640) Image processing : Superresolution
(110.5220) Imaging systems : Photolithography
(240.6680) Optics at surfaces : Surface plasmons
(260.3910) Physical optics : Metal optics

ToC Category:
Research Papers

Original Manuscript: February 7, 2005
Revised Manuscript: March 7, 2005
Published: March 21, 2005

David Melville and Richard Blaikie, "Super-resolution imaging through a planar silver layer," Opt. Express 13, 2127-2134 (2005)

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  1. J. B. Pendry, �??Negative refraction makes a perfect lens,�?? Phys. Rev. Lett. 85, 3966�??3969 (2000). [CrossRef] [PubMed]
  2. R. A. Shelby, D. R. Smith and S. Schultz, �??Experimental verification of a negative index of refraction,�?? Science 292, 77�??79 (2001). [CrossRef] [PubMed]
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